Issued Patents 2002
Showing 1–25 of 25 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6494223 | Wet cleaning apparatus utilizing ultra-pure water rinse liquid with hydrogen gas | Kazuhiko Kawada, Toshihiro II, Masatoshi Hashino, Noboru Kubota | 2002-12-17 |
| 6493263 | Semiconductor computing circuit and computing apparatus | Tadashi Shibata, Masahiro Konda | 2002-12-10 |
| 6462298 | Long life welding electrode and its fixing structure, welding head and welding method | Takahisa Nitta, Yasuyuki Shirai, Osamu Nakamura | 2002-10-08 |
| 6459312 | Semiconductor integrated circuit, delay-locked loop having the same circuit, self-synchronizing pipeline type system, voltage-controlled oscillator, and phase-locked loop | Katsuhisa Ogawa, Tadashi Shibata | 2002-10-01 |
| 6456532 | Semiconductor memory device | Tadashi Shibata, Keng Hoong Wee, Takemi Yonezawa, Toshiyuki Nozawa, Takahisa Nitta | 2002-09-24 |
| 6456992 | Semiconductor arithmetic circuit | Tadashi Shibata, Tatsuo Morimoto, Ryu Kaiwara | 2002-09-24 |
| 6450190 | Method of detecting abnormalities in flow rate in pressure-type flow controller | Seiichi Iida, Satoshi Kagatsume, Jun Hirose, Kazuo Fukasawa, Hiroshi Koizumi +6 more | 2002-09-17 |
| 6452408 | Impedance measurement tool | Akira Nakano, Koichi Fukuda, Shoichi Ono | 2002-09-17 |
| 6446573 | Plasma process device | Masaki Hirayama, Tatsushi Yamamoto, Takamitsu Tadera | 2002-09-10 |
| 6436353 | Gas recovering apparatus | Takahisa Nitta, Yasuyuki Shirai, Taiji Hashimoto, Kazuhide Ino | 2002-08-20 |
| 6427462 | Semiconductor manufacturing facility, semiconductor manufacturing apparatus and semiconductor manufacturing method | Osamu Suenaga, Sadao Kobayashi | 2002-08-06 |
| 6422264 | Parallel divided flow-type fluid supply apparatus, and fluid-switchable pressure-type flow control method and fluid-switchable pressure-type flow control system for the same fluid supply apparatus | Satoshi Kagatsume, Kazuhiko Sugiyama, Yukio Minami, Kouji Nishino, Ryousuke Dohi +13 more | 2002-07-23 |
| 6423178 | Apparatus for plasma process | Masaki Hirayama | 2002-07-23 |
| 6416586 | Cleaning method | Toshihiro Il, Kenji Mori, Toshikazu Abe, Hirosi Arakawa, Takahisa Nitta | 2002-07-09 |
| 6408879 | Fluid control device | Yukio Minami, Akihiro Morimoto, Nobukazu Ikeda, Keiji Hirao, Takashi Hirose +2 more | 2002-06-25 |
| 6394415 | Fluid control valve and fluid supply/exhaust system | Migaku Takahashi, Michio Yamaji, Tsuyoshi Tanikawa, Nobukazu Ikeda, Ryosuke Dohi +5 more | 2002-05-28 |
| 6378192 | Method of fixing a plurality of lower members each having reference bore for installing upper member, and fixing jigs | Michio Yamaji, Tsutomu Shinohara | 2002-04-30 |
| 6375911 | Method and device for treating exhaust gas | Yoshio Ishihara, Koh Matsumoto, Tetsuya Kimijima | 2002-04-23 |
| 6370897 | Semiconductor manufacturing facility | Osamu Suenaga, Sadao Kobayashi | 2002-04-16 |
| 6372646 | Optical article, exposure apparatus or optical system using it, and process for producing it | Kazuyuki Harada, Nobuyoshi Tanaka | 2002-04-16 |
| 6357385 | Plasma device | Takahisa Nitta, Masaki Hirayama, Haruyuki Takano, Ryu Kaiwara | 2002-03-19 |
| 6350376 | Reductive heat exchange water and heat exchange system using such water | Takashi Imaoka, Hiroshi Morita, Isamu Sugiyama, Masaki Hirayama | 2002-02-26 |
| 6349670 | Plasma treatment equipment | Akira Nakano, Koichi Fukuda, Sung-Chul Kim, Yasuhiko Kasama, Shoichi Ono | 2002-02-26 |
| 6348157 | Cleaning method | Takahisa Nitta, Kazuhiko Kawada, Mitsunori Nakamori, Toshihiro II | 2002-02-19 |
| 6343239 | Transportation method for substrate wafers and transportation apparatus | Masayuki Toda, Yoshio Ishihara | 2002-01-29 |