Issued Patents All Time
Showing 25 most recent of 76 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 11592740 | Wire grid polarizer manufacturing methods using frequency doubling interference lithography | Jang Fung Chen, Christopher Dennis Bencher | 2023-02-28 |
| 11499306 | Differential settlement anchors | Frank Schwab | 2022-11-15 |
| 11243480 | System for making accurate grating patterns using multiple writing columns each making multiple scans | Hwan J. Jeong | 2022-02-08 |
| 10983389 | Wire grid polarizer manufacturing method | Jang Fung Chen | 2021-04-20 |
| 10705431 | Quarter wave light splitting | Christopher Dennis Bencher, Joseph R. Johnson, Mehdi Vaez-Iravani | 2020-07-07 |
| 10409172 | Digital photolithography using compact eye module layout | Thomas Laidig, Timothy N. Thomas | 2019-09-10 |
| 10162268 | Twisted kaleido | Timothy N. Thomas | 2018-12-25 |
| 9907152 | Illumination system with monitoring optical output power | Jeffrey Kaskey, Thomas Laidig, Jang Fung Chen | 2018-02-27 |
| 9733573 | Optical projection array exposure system | Thomas Laidig, Jeffrey Kaskey, Jang Fung Chen | 2017-08-15 |
| 9645496 | Maskless digital lithography systems and methods with image motion compensation | — | 2017-05-09 |
| 9401278 | Apparatus and methods for improving the intensity profile of a beam image used to process a substrate | Andrew M. Hawryluk, Boris Grek | 2016-07-26 |
| 9329484 | Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist | John S. Petersen | 2016-05-03 |
| 9304410 | Apparatus and method of direct writing with photons beyond the diffraction limit | Rudolf H. Hendel, John S. Petersen, Hwan J. Jeong | 2016-04-05 |
| 9250509 | Optical projection array exposure system | Thomas Laidig, Jeffrey Kaskey, Jang Fung Chen | 2016-02-02 |
| 9195139 | Apparatus and method of direct writing with photons beyond the diffraction limit using two-color resist | John S. Petersen | 2015-11-24 |
| 9075013 | Apparatus and methods for microscopy having resolution beyond the Abbe limit | Hwan J. Jeong, John S. Petersen | 2015-07-07 |
| 8742286 | Apparatus and method for improving the intensity profile of a beam image used to process a substrate | Andrew M. Hawryluk, Boris Grek | 2014-06-03 |
| 8642232 | Method of direct writing with photons beyond the diffraction limit | Rudolf H. Hendel, John S. Petersen, Hwan J. Jeong | 2014-02-04 |
| 8559014 | High-resolution, common-path interferometric imaging systems and methods | Hwan J. Jeong | 2013-10-15 |
| 8314360 | Apparatuses and methods for irradiating a substrate to avoid substrate edge damage | Boris Grek | 2012-11-20 |
| 8153930 | Apparatus and methods for improving the intensity profile of a beam image used to process a substrate | Andrew M. Hawryluk, Boris Grek | 2012-04-10 |
| 7947968 | Processing substrates using direct and recycled radiation | Shiyu Zhang | 2011-05-24 |
| 7879741 | Laser thermal annealing of lightly doped silicon substrates | Somit Talwar, Michael O. Thompson, Boris Grek | 2011-02-01 |
| 7767927 | Methods and apparatus for remote temperature measurement of a specular surface | — | 2010-08-03 |
| 7763828 | Laser thermal processing with laser diode radiation | Somit Talwar | 2010-07-27 |