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Apparatus and method for improving the intensity profile of a beam image used to process a substrate |
Andrew M. Hawryluk, David A. Markle |
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Evaporative thermal management of grazing incidence collectors for EUV lithography |
Daniel Stearns, Natale M. Ceglio |
2014-05-20 |
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Apparatuses and methods for irradiating a substrate to avoid substrate edge damage |
David A. Markle |
2012-11-20 |
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Apparatus and methods for improving the intensity profile of a beam image used to process a substrate |
Andrew M. Hawryluk, David A. Markle |
2012-04-10 |
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Laser thermal annealing of lightly doped silicon substrates |
Somit Talwar, Michael O. Thompson, David A. Markle |
2011-02-01 |
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Ultra-wide band AWG multiplexer |
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2010-11-23 |
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Methods and apparatus for temperature measurement and control on a remote substrate surface |
Michael Weitzel, David A. Markle |
2010-06-29 |
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Broadcasting arrayed waveguide |
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Apparatus and methods for improving the intensity profile of a beam image used to process a substrate |
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Michael Weitzel, Igor Landau |
2007-11-06 |
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Methods and apparatus for irradiating a substrate to avoid substrate edge damage |
David A. Markle |
2007-07-03 |
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Heat shield for thermal processing |
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Laser thermal annealing of lightly doped silicon substrates |
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Fiber-optic interferometer employing low-coherence-length light for precisely measuring absolute distance and tilt |
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