Issued Patents All Time
Showing 25 most recent of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7879741 | Laser thermal annealing of lightly doped silicon substrates | Michael O. Thompson, Boris Grek, David A. Markle | 2011-02-01 |
| 7763828 | Laser thermal processing with laser diode radiation | David A. Markle | 2010-07-27 |
| 7731798 | Heated chuck for laser thermal processing | Iqbal Shareef, Igor Landau, David A. Markle, Michael O. Thompson, Ivelin Angelov +1 more | 2010-06-08 |
| 7494942 | Laser thermal annealing of lightly doped silicon substrates | David A. Markle | 2009-02-24 |
| 7399945 | Method of thermal processing a substrate with direct and redirected reflected radiation | David A. Markle | 2008-07-15 |
| 7326877 | Laser thermal processing chuck with a thermal compensating heater module | Iqbal Shareef, Igor Landau, David A. Markle, Michael O. Thompson, Ivelin Angelov +1 more | 2008-02-05 |
| 7157660 | Laser scanning apparatus and methods for thermal processing | Michael O. Thompson, David A. Markle | 2007-01-02 |
| 7154066 | Laser scanning apparatus and methods for thermal processing | David A. Markle | 2006-12-26 |
| 7148159 | Laser thermal annealing of lightly doped silicon substrates | Michael O. Thompson, Boris Grek, David A. Markle | 2006-12-12 |
| 7145104 | Silicon layer for uniformizing temperature during photo-annealing | Michael O. Thompson | 2006-12-05 |
| 7098155 | Laser thermal annealing of lightly doped silicon substrates | David A. Markle | 2006-08-29 |
| 6825101 | Methods for annealing a substrate and article produced by such methods | Andrew M. Hawryluk, David A. Markle | 2004-11-30 |
| 6777317 | Method for semiconductor gate doping | Cindy Seibel | 2004-08-17 |
| 6747245 | Laser scanning apparatus and methods for thermal processing | Michael O. Thompson, David A. Markle | 2004-06-08 |
| 6645838 | Selective absorption process for forming an activated doped region in a semiconductor | Yun Wang, Michael O. Thompson | 2003-11-11 |
| 6635541 | Method for annealing using partial absorber layer exposed to radiant energy and article made with partial absorber layer | Yun Wang, Carol M. Gelatos | 2003-10-21 |
| 6635588 | Method for laser thermal processing using thermally induced reflectivity switch | Andrew M. Hawryluk, Yun Wang, Michael O. Thompson | 2003-10-21 |
| 6570656 | Illumination fluence regulation system and method for use in thermal processing employed in the fabrication of reduced-dimension integrated circuits | James B. Owens, Jr., Andrew M. Hawryluk, Yun Wang | 2003-05-27 |
| 6495390 | Thermally induced reflectivity switch for laser thermal processing | Andrew M. Hawryluk, Yun Wang, Michael O. Thompson | 2002-12-17 |
| 6479821 | Thermally induced phase switch for laser thermal processing | Andrew M. Hawryluk, Yun Wang, David A. Markle, Michael O. Thompson | 2002-11-12 |
| 6420264 | Method of forming a silicide region in a Si substrate and a device having same | Yun Wang | 2002-07-16 |
| 6387803 | Method for forming a silicide region on a silicon body | Gaurav Verma, Karl-Josef Kramer, Kurt Weiner | 2002-05-14 |
| 6388297 | Structure and method for an optical block in shallow trench isolation for improved laser anneal control | John Cronin | 2002-05-14 |
| 6383956 | Method of forming thermally induced reflectivity switch for laser thermal processing | Andrew M. Hawryluk, Yun Wang, Michael O. Thompson | 2002-05-07 |
| 6380044 | High-speed semiconductor transistor and selective absorption process forming same | Yun Wang, Michael O. Thompson | 2002-04-30 |