Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9609731 | Systems and methods for synchronous operation of debris-mitigation devices | Raymond Merrill, Jr., Daniel Stearns | 2017-03-28 |
| 9585236 | Sn vapor EUV LLP source system for EUV lithography | Daniel Stearns, Richard Levesque | 2017-02-28 |
| 9057962 | Source-collector module with GIC mirror and LPP EUV light source | Giovanni Nocerino, Fabio Zocchi | 2015-06-16 |
| 8895946 | Source-collector modules for EUV lithography employing a GIC mirror and a LPP source | Daniel Stearns, Jacques Kools, Giuseppe Valsecchi, Fabio Zocchi, Riccardo Binda | 2014-11-25 |
| 8873025 | EUV collector system with enhanced EUV radiation collection | Gopal Vasudevan | 2014-10-28 |
| 8746975 | Thermal management systems, assemblies and methods for grazing incidence collectors for EUV lithography | Giovanni Bianucci, Fabio Zocchi, Robert Banham, Marco Pedrali, Boris Grek +5 more | 2014-06-10 |
| 8731139 | Evaporative thermal management of grazing incidence collectors for EUV lithography | Boris Grek, Daniel Stearns | 2014-05-20 |
| 8686381 | Source-collector module with GIC mirror and tin vapor LPP target system | Richard Levesque, Giovanni Nocerino, Fabio Zocchi | 2014-04-01 |
| 8587768 | EUV collector system with enhanced EUV radiation collection | Gopal Vasudevan | 2013-11-19 |
| 8344339 | Source-collector module with GIC mirror and tin rod EUV LPP target system | Richard Levesque, Giovanni Nocerino, Fabio Zocchi | 2013-01-01 |
| 8330131 | Source-collector module with GIC mirror and LPP EUV light source | Giovanni Nocerino, Fabio Zocchi | 2012-12-11 |
| 8258485 | Source-collector module with GIC mirror and xenon liquid EUV LPP target system | Richard Levesque, Giovanni Nocerino, Fabio Zocchi | 2012-09-04 |
| 6770862 | Scalable wafer inspection | Dragos Maciuca | 2004-08-03 |
| 6010600 | Maskless deposition technique for the physical vapor deposition of thin film and multilayer coatings with subnanometer precision and accuracy | Stephen P. Vernon | 2000-01-04 |
| 6002553 | Giant magnetoresistive sensor | Daniel G. Stearns, Stephen P. Vernon, Andrew M. Hawryluk | 1999-12-14 |
| 5691541 | Maskless, reticle-free, lithography | David A. Markle | 1997-11-25 |
| 5257132 | Broadband diffractive lens or imaging element | Andrew M. Hawryluk, Richard London, Lynn G. Seppala | 1993-10-26 |
| 5178974 | Virtually distortion-free imaging system for large field, high resolution lithography using electrons, ions or other particle beams | Andrew M. Hawryluk | 1993-01-12 |
| 5176970 | Virtually distortion-free imaging system for large field, high resolution lithography | Andrew M. Hawryluk | 1993-01-05 |
| 5071207 | Broadband diffractive lens or imaging element | Andrew M. Hawryluk, Richard London, Lynn G. Seppala | 1991-12-10 |
| 4870648 | X-ray beamsplitter | Daniel Stearns, Andrew M. Hawryluk, Troy W. Barbee, Jr. | 1989-09-26 |