Issued Patents All Time
Showing 1–15 of 15 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 12272526 | Substrate processing method and substrate processing apparatus | Tsukasa Hirayama | 2025-04-08 |
| 12080521 | Plasma processing method | Michiko Nakaya, Yuya Minoura | 2024-09-03 |
| 11804379 | Etching method and plasma processing apparatus | Michiko Nakaya | 2023-10-31 |
| 11749508 | Plasma processing method | Michiko Nakaya, Yuya Minoura | 2023-09-05 |
| 11631590 | Substrate processing method, substrate processing apparatus and cleaning apparatus | Muneyuki Omi, Takahiro Murakami | 2023-04-18 |
| 11404281 | Method of etching silicon containing films selectively against each other | Sho Tominaga | 2022-08-02 |
| 11342167 | Plasma processing method including cleaning of inside of chamber main body of plasma processing apparatus | Jin Kudo | 2022-05-24 |
| 11251049 | Etching method and plasma processing apparatus | Masahiro Tadokoro | 2022-02-15 |
| 10903084 | Method of etching silicon containing films selectively against each other | Sho Tominaga | 2021-01-26 |
| 10811275 | Plasma etching method and plasma etching apparatus | Yuya Minoura | 2020-10-20 |
| 10714370 | Mounting table and plasma processing apparatus | Taketoshi TOMIOKA, Toshiyuki MAKABE | 2020-07-14 |
| 10714320 | Plasma processing method including cleaning of inside of chamber main body of plasma processing apparatus | Jin Kudo | 2020-07-14 |
| 10410877 | Etching method | Ryuichi TAKASHIMA, Yoshinobu Ooya | 2019-09-10 |
| 10361070 | Method of processing target object | Jin Kudo | 2019-07-23 |
| 10304691 | Method of etching silicon oxide and silicon nitride selectively against each other | Sho Tominaga | 2019-05-28 |