Issued Patents All Time
Showing 151–175 of 237 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 5937142 | Multi-zone illuminator for rapid thermal processing | Yong Jin Lee, Ahmad Kermani, William Messner | 1999-08-10 |
| 5876573 | High magnetic flux cathode apparatus and method for high productivity physical-vapor deposition | Dorian Heimanson, Cecil J. Davis, Thomas R. Omstead | 1999-03-02 |
| 5871588 | Programmable ultraclean electromagnetic substrate rotation apparatus and method for microelectronics manufacturing equipment | Yong Jin Lee | 1999-02-16 |
| 5866472 | Direct gas-phase doping of semiconductor wafers using an organic dopant source | — | 1999-02-02 |
| 5846883 | Method for multi-zone high-density inductively-coupled plasma generation | — | 1998-12-08 |
| 5746897 | High magnetic flux permanent magnet array apparatus and method for high productivity physical vapor deposition | Dorian Heimanson, Paul E. Spronz, Thomas R. Omstead | 1998-05-05 |
| 5741070 | Apparatus for real-time semiconductor wafer temperature measurement based on a surface roughness characteristic of the wafer | — | 1998-04-21 |
| 5719495 | Apparatus for semiconductor device fabrication diagnosis and prognosis | — | 1998-02-17 |
| 5716861 | Insulated-gate field-effect transistor structure and method | — | 1998-02-10 |
| 5715361 | Rapid thermal processing high-performance multizone illuminator for wafer backside heating | — | 1998-02-03 |
| 5700628 | Dry microlithography process | — | 1997-12-23 |
| 5641707 | Direct gas-phase doping of semiconductor wafers using an organic dopant source of phosphorus | — | 1997-06-24 |
| 5635409 | Real-time multi-zone semiconductor wafer temperature and process uniformity control system | — | 1997-06-03 |
| 5599735 | Method for doped shallow junction formation using direct gas-phase doping | — | 1997-02-04 |
| 5525780 | Method and apparatus for uniform semiconductor material processing using induction heating with a chuck member | — | 1996-06-11 |
| 5508934 | Multi-point semiconductor wafer fabrication process temperature control system | Habib N. Najm | 1996-04-16 |
| 5506672 | System for measuring slip dislocations and film stress in semiconductor processing utilizing an adjustable height rotating beam splitter | — | 1996-04-09 |
| 5504040 | Planarized material layer deposition using condensed-phase processing | — | 1996-04-02 |
| 5496750 | Elevated source/drain junction metal oxide semiconductor field-effect transistor using blanket silicon deposition | — | 1996-03-05 |
| 5489550 | Gas-phase doping method using germanium-containing additive | — | 1996-02-06 |
| 5474381 | Method for real-time semiconductor wafer temperature measurement based on a surface roughness characteristic of the wafer | — | 1995-12-12 |
| 5464499 | Multi-electrode plasma processing apparatus | Cecil J. Davis, John I. Jones, Robert T. Matthews | 1995-11-07 |
| 5453124 | Programmable multizone gas injector for single-wafer semiconductor processing equipment | Cecil J. Davis, Robert T. Matthews | 1995-09-26 |
| 5447875 | Self-aligned silicided gate process | — | 1995-09-05 |
| 5446825 | High performance multi-zone illuminator module for semiconductor wafer processing | Cecil J. Davis, Robert T. Matthews | 1995-08-29 |