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Method for the integration of monolithic thin film radiation detector systems |
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Formation of metal gate electrode using rare earth alloy incorporated into mid gap metal |
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Formation of metal gate electrode using rare earth alloy incorporated into mid gap metal |
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Integration of high-k metal gate stack into direct silicon bonding (DSB) hybrid orientation technology (HOT) pMOS process flow |
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Method of forming an isolation structure by performing multiple high-density plasma depositions |
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Methods and systems to mitigate etch stop clipping for shallow trench isolation fabrication |
James Joseph Chambers, Leif C. Olsen |
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Methods and systems to mitigate etch stop clipping for shallow trench isolation fabrication |
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Top surface roughness reduction of high-k dielectric materials using plasma based processes |
James Joseph Chambers, Luigi Colombo, Mark Visokay |
2006-10-03 |
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Method to engineer the inverse narrow width effect (INWE) in CMOS technology using shallow trench isolation (STI) |
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Method for removing contaminants on a substrate |
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High-k gate dielectric with uniform nitrogen profile and methods for making the same |
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