| D981195 |
Film applicator tool |
Wenjun Xu |
2023-03-21 |
| 7815738 |
Deposition tool cleaning process having a moving plasma zone |
Ignacio Blanco, Nathan Kruse |
2010-10-19 |
| 7799632 |
Method of forming an isolation structure by performing multiple high-density plasma depositions |
Manuel Quevedo-Lopez, Louis H. Breaux |
2010-09-21 |
| 7524777 |
Method for manufacturing an isolation structure using an energy beam treatment |
Puneet Kohli, Manoj Mehrotra, Sameer Ajmera |
2009-04-28 |
| 7465635 |
Method for manufacturing a gate sidewall spacer using an energy beam treatment |
Puneet Kohli, Manoj Mehrotra, Sameer Ajmera |
2008-12-16 |
| 7423344 |
Bi-layer etch stop process for defect reduction and via stress migration improvement |
Tae Seung Kim, Nathan Kruse, August Fischer, Ralf B. Willecke |
2008-09-09 |
| 7199047 |
Bi-layer etch stop process for defect reduction and via stress migration improvement |
Tae Seung Kim, Nathan Kruse, August Fischer, Ralf B. Willecke |
2007-04-03 |
| 7112546 |
Method of manufacturing semiconductor devices comprising a deposition tool cleaning process having a moving plasma zone |
Ignacio Blanco, Nathan Kruse |
2006-09-26 |
| 6998275 |
Hydrogen-less CVD TiN process for FeRAM VIA0 barrier application |
M. Grant Albrecht, Qidu Jiang, Linlin Chen |
2006-02-14 |
| 6734099 |
System for preventing excess silicon consumption in ultra shallow junctions |
Jiong-Ping Lu, Yuqing Xu |
2004-05-11 |
| 6630394 |
System for reducing silicon-consumption through selective deposition |
Jiong-Ping Lu, Yuqing Xu |
2003-10-07 |
| 6277744 |
Two-level silane nucleation for blanket tungsten deposition |
Ting YUAN, Bob Anderson, Clive Jones |
2001-08-21 |
| 6248603 |
Method of measuring dielectric layer thickness using SIMS |
Clive Jones |
2001-06-19 |