Issued Patents All Time
Showing 26–34 of 34 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8671878 | Profile and CD uniformity control by plasma oxidation treatment | Sung Jin Cho, Gowri Kamarthy, Linda Braly | 2014-03-18 |
| 8668805 | Line end shortening reduction during etch | Gowri Kota, Frank Y. Lin | 2014-03-11 |
| 8431461 | Silicon nitride dry trim without top pulldown | Yoshie Kimura, Tae Won Kim, Qian Fu, Gladys So-Wan Lo, Ganesh Upadhyaya +1 more | 2013-04-30 |
| 8298949 | Profile and CD uniformity control by plasma oxidation treatment | Sung Jin Cho, Gowri Kamarthy, Linda Braly | 2012-10-30 |
| 7491343 | Line end shortening reduction during etch | Yoko Y. Adams, Gowri Kota, Frank Y. Lin | 2009-02-17 |
| 7407597 | Line end shortening reduction during etch | Gowri Kota, Frank Y. Lin | 2008-08-05 |
| 6281093 | Method to reduce trench cone formation in the fabrication of shallow trench isolations | Yelehanka Ramachandramurthy Pradeep, Zheng Zou, Henry Gerung | 2001-08-28 |
| 6124927 | Method to protect chamber wall from etching by endpoint plasma clean | Zou Zheng, Yelehanka Ramachandra Murthy Pradeep, Zhou Mei Sheng | 2000-09-26 |
| 6001706 | Method for making improved shallow trench isolation for semiconductor integrated circuits | Poh Suan Tan, Lap Chan, Qian Gang | 1999-12-14 |