Issued Patents All Time
Showing 26–45 of 45 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6037252 | Method of titanium nitride contact plug formation | Joseph T. Hillman, Michael S. Ameen | 2000-03-14 |
| 5975912 | Low temperature plasma-enhanced formation of integrated circuits | Joseph T. Hillman | 1999-11-02 |
| 5972790 | Method for forming salicides | Chantal Arena, Joseph T. Hillman, Michael S. Ameen, Jacques Faguet | 1999-10-26 |
| 5866213 | Method for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor | Joseph T. Hillman, Rene E. LeBlanc | 1999-02-02 |
| 5716870 | Method for producing titanium thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor | Joseph T. Hillman, Rene E. LeBlanc | 1998-02-10 |
| 5665640 | Method for producing titanium-containing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor | Joseph T. Hillman, Rene E. LeBlanc | 1997-09-09 |
| 5628829 | Method and apparatus for low temperature deposition of CVD and PECVD films | Joseph T. Hillman, Rikhit Arora | 1997-05-13 |
| 5610106 | Plasma enhanced chemical vapor deposition of titanium nitride using ammonia | Joseph T. Hillman, Rikhit Arora | 1997-03-11 |
| 5593511 | Method of nitridization of titanium thin films | Joseph T. Hillman | 1997-01-14 |
| 5575856 | Thermal cycle resistant seal and method of sealing for use with semiconductor wafer processing apparatus | Brian Shekerjian, Joseph T. Hillman | 1996-11-19 |
| 5567243 | Apparatus for producing thin films by low temperature plasma-enhanced chemical vapor deposition using a rotating susceptor reactor | Joseph T. Hillman, Rene E. LeBlanc | 1996-10-22 |
| 5567483 | Process for plasma enhanced anneal of titanium nitride | Joseph T. Hillman, Rikhit Arora | 1996-10-22 |
| 5434110 | Methods of chemical vapor deposition (CVD) of tungsten films on patterned wafer substrates | Helen E. Rebenne | 1995-07-18 |
| 5378501 | Method for chemical vapor deposition of titanium nitride films at low temperatures | Joseph T. Hillman | 1995-01-03 |
| 5370739 | Rotating susceptor semiconductor wafer processing cluster tool module useful for tungsten CVD | Helen E. Rebenne, Rene E. LeBlanc, Carl Louis White, Rikhit Arora | 1994-12-06 |
| 5356476 | Semiconductor wafer processing method and apparatus with heat and gas flow control | Helen E. Rebenne, Rene E. LeBlanc, Carl Louis White, Rikhit Arora | 1994-10-18 |
| 5342652 | Method of nucleating tungsten on titanium nitride by CVD without silane | Damodaran Srinivas | 1994-08-30 |
| 5273588 | Semiconductor wafer processing CVD reactor apparatus comprising contoured electrode gas directing means | Helen E. Rebenne, Rene E. LeBlanc, Carl Louis White, Rikhit Arora | 1993-12-28 |
| 4796562 | Rapid thermal CVD apparatus | Daniel L. Brors, Larry R. Lane, Mark W. Goldsborough, Jason M. Samsel, Max Van Mastrigt | 1989-01-10 |
| 4668365 | Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition | David N. Wang, Sasson Somekh, Dan Maydan | 1987-05-26 |