| 6780464 |
Thermal gradient enhanced CVD deposition at low pressure |
Robert C. Cook |
2004-08-24 |
| 6506691 |
High rate silicon nitride deposition method at low pressures |
Robert C. Cook |
2003-01-14 |
| 6352593 |
Mini-batch process chamber |
Robert C. Cook |
2002-03-05 |
| 6352594 |
Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors |
Robert C. Cook |
2002-03-05 |
| 6321680 |
Vertical plasma enhanced process apparatus and method |
Robert C. Cook |
2001-11-27 |
| 6287635 |
High rate silicon deposition method at low pressures |
Robert C. Cook |
2001-09-11 |
| 6235652 |
High rate silicon dioxide deposition at low pressures |
Robert C. Cook |
2001-05-22 |
| RE36957 |
Method and apparatus for cold wall chemical vapor deposition |
Robert C. Cook |
2000-11-21 |
| 5551985 |
Method and apparatus for cold wall chemical vapor deposition |
Robert C. Cook |
1996-09-03 |
| 5291030 |
Optoelectronic detector for chemical reactions |
— |
1994-03-01 |
| 4920908 |
Method and apparatus for deposition of tungsten silicides |
James A. Fair, Kenneth A. Monnig |
1990-05-01 |
| 4851295 |
Low resistivity tungsten silicon composite film |
— |
1989-07-25 |
| 4796562 |
Rapid thermal CVD apparatus |
Larry R. Lane, Mark W. Goldsborough, Jason M. Samsel, Max Van Mastrigt, Robert F. Foster |
1989-01-10 |
| 4629635 |
Process for depositing a low resistivity tungsten silicon composite film on a substrate |
— |
1986-12-16 |
| 4565157 |
Method and apparatus for deposition of tungsten silicides |
James A. Fair, Kenneth A. Monnig |
1986-01-21 |
| 4539278 |
Mask structure for X-ray lithography and method for making same |
Bob Williams |
1985-09-03 |