Issued Patents All Time
Showing 26–40 of 40 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6869868 | Method of fabricating a MOSFET device with metal containing gate structures | Hsien-Kuang Chiu, Fang Chen, Haur-Ywh Chen, Hun-Jan Tao | 2005-03-22 |
| 6867084 | Gate structure and method of forming the gate dielectric with mini-spacer | Ming-Huan Tsai, Fang Chen, Hun-Jan Tao | 2005-03-15 |
| 6849531 | Phosphoric acid free process for polysilicon gate definition | Li-Te Lin, Fang-Chen Cheng, Huin-Jer Lin, Hun-Jan Tao | 2005-02-01 |
| 6828237 | Sidewall polymer deposition method for forming a patterned microelectronic layer | Bor-Wen Chan, Fang Chen, Hsien-Kuang Chiu, Han Tao | 2004-12-07 |
| 6828198 | System-on-chip (SOC) solutions with multiple devices by multiple poly gate trimming process | Hung-Der Su, Shien-Yang Wu, Yung-Shun Chen, Tung-Heng Shie | 2004-12-07 |
| 6818553 | Etching process for high-k gate dielectrics | Mo Yu | 2004-11-16 |
| 6812044 | Advanced control for plasma process | Hsien-Kuang Chiu, Bor-Wen Chan, Baw-Ching Perng, Hun-Jan Tao | 2004-11-02 |
| 6777340 | Method of etching a silicon containing layer using multilayer masks | Hsien-Kuang Chiu, Fang Chen, Hun-Jan Tao, Jeng-Horng Chen | 2004-08-17 |
| 6764903 | Dual hard mask layer patterning method | Bor-Wen Chan, Hun-Jan Tao | 2004-07-20 |
| 6524938 | Method for gate formation with improved spacer profile control | Hun-Jan Tao | 2003-02-25 |
| 6503848 | Method of forming a smooth polysilicon surface using a soft etch to enlarge the photo lithography window | Bor-Wen Chan, Huan-Just Lin, Hun-Jan Tao | 2003-01-07 |
| 6407002 | Partial resist free approach in contact etch to improve W-filling | Li-Te Lin, Ming-Huan Tsai, Hun-Jan Tao | 2002-06-18 |
| 6333271 | Multi-step plasma etch method for plasma etch processing a microelectronic layer | Yu-I Wang, Hun-Jan Tao, Huan-Just Lin | 2001-12-25 |
| 6297162 | Method to reduce silicon oxynitride etch rate in a silicon oxide dry etch | Syun-Ming Jang, Chu-Yan Fu | 2001-10-02 |
| 6235653 | Ar-based si-rich oxynitride film for dual damascene and/or contact etch stop layer | Hung-Ju Chien, Wen-Kung Cheng, Yin-Lang Wang | 2001-05-22 |