Issued Patents All Time
Showing 26–50 of 79 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9589803 | Gate electrode of field effect transistor | Clement Hsingjen Wann, Yi-An Lin, Chun-Wei Chang, Sey-Ping Sun | 2017-03-07 |
| 9559182 | Self-aligned dual-metal silicide and germanide formation | Clement Hsingjen Wann, Sey-Ping Sun, Ling-Yen Yeh, Chi-Yuan Shih, Li-Chi Yu +6 more | 2017-01-31 |
| 9530655 | Slurry composition for chemical mechanical polishing of Ge-based materials and devices | Chia-Jung Hsu, Yun-Lung Ho, Song-Yuan Chang, Teng-Chun Tsai | 2016-12-27 |
| 9443964 | Fin structure of FinFet | Gin-Chen Huang, Ching-Hong Jiang, Sey-Ping Sun, Clement Hsingjen Wann | 2016-09-13 |
| 9443769 | Wrap-around contact | Sung-Li Wang, Ding-Kang Shih, Meng-Chun Chang, Yi-An Lin, Gin-Chen Huang +5 more | 2016-09-13 |
| 9416297 | Chemical mechanical polishing method using slurry composition containing N-oxide compound | Chia-Jung Hsu, Yun-Lung Ho, Wen-Feng Chueh, Sey-Ping Sun, Song-Yuan Chang | 2016-08-16 |
| 9368446 | Self aligned contact formation | Shao-Ming Yu, Gin-Chen Huang, Chia-Jung Hsu, Sey-Ping Sun, Clement Hsingjen Wann | 2016-06-14 |
| 9337103 | Method for removing hard mask oxide and making gate structure of semiconductor devices | Yi-An Lin, Chun-Wei Chang, Sey-Ping Sun, Clement Hsingjen Wann | 2016-05-10 |
| 9263252 | Method of protecting an interlayer dielectric layer and structure formed thereby | Chun-Wei Chang, Yi-An Lin, Sey-Ping Sun, Clement Hsingjen Wann, Yu-Lien Huang | 2016-02-16 |
| 9257323 | Semiconductor device and method for forming the same | Yu-Lien Huang, Tung Ying Lee, Pei-Yi Lin, Chun-Hsiang Fan, Sheng-Wen Yu +1 more | 2016-02-09 |
| 9245792 | Method for forming interconnect structures | Kuo-Hwa Tzeng, Cheng-Yuan Tsai | 2016-01-26 |
| 9214556 | Self-aligned dual-metal silicide and germanide formation | Clement Hsingjen Wann, Sey-Ping Sun, Ling-Yen Yeh, Chi-Yuan Shih, Li-Chi Yu +6 more | 2015-12-15 |
| 9159808 | Selective etch-back process for semiconductor devices | Kuo-Hwa Tzeng, Cheng-Yuan Tsai | 2015-10-13 |
| 9105661 | Fin field effect transistor gate oxide | Gin-Chen Huang, Hsingjen Wann | 2015-08-11 |
| 9093530 | Fin structure of FinFET | Gin-Chen Huang, Ching-Hong Jiang, Sey-Ping Sun, Clement Hsingjen Wann | 2015-07-28 |
| 9034716 | Method of making a FinFET device | Sey-Ping Sun, Sung-Li Wang, Chin-Hsiang Lin, Clement Hsingjen Wann | 2015-05-19 |
| 9006802 | Semiconductor device manufacturing methods and methods of forming insulating material layers | Gin-Chen Huang, Tsai-Fu Hsiao, Ching-Hong Jiang, Hongfa Luan, Sey-Ping Sun +1 more | 2015-04-14 |
| 8940597 | In-situ metal gate recess process for self-aligned contact application | Chia-Jung Hsu, Gin-Chen Huang, Yi-An Lin, Sey-Ping Sun, Clement Hsingjen Wann | 2015-01-27 |
| 8921136 | Self aligned contact formation | Shao-Ming Yu, Gin-Chen Huang, Chia-Jung Hsu, Sey-Ping Sun, Clement Hsingjen Wann | 2014-12-30 |
| 8853052 | Method of manufacturing a semiconductor device | Gin-Chen Huang, Yi-An Lin, Ching-Hong Jiang, Sey-Ping Sun, Clement Hsingjen Wann | 2014-10-07 |
| 8778807 | Method of reducing delamination in the fabrication of small-pitch devices | Chih-Yu Lai, Cheng-Ta Wu, Cheng-Yuan Tsai | 2014-07-15 |
| 8546242 | Hybrid gap-fill approach for STI formation | Chih-Hsiang Chang, Kuo-Hwa Tzeng, Cheng-Yuan Tsai | 2013-10-01 |
| 8524587 | Non-uniformity reduction in semiconductor planarization | Jeff J. Xu | 2013-09-03 |
| 8440580 | Method of fabricating silicon nitride gap-filling layer | Chao-Ching Hsieh, Chien-Chung Huang | 2013-05-14 |
| 8367534 | Non-uniformity reduction in semiconductor planarization | Jeff J. Xu | 2013-02-05 |