Issued Patents All Time
Showing 301–325 of 342 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9299810 | Fin-type field effect transistor and method of fabricating the same | Chih-Hao Wang, Zhiqiang Wu, Carlos H. Diaz, Jean-Pierre Colinge | 2016-03-29 |
| 9281378 | Fin recess last process for FinFET fabrication | Shi Ning Ju, Guan-Lin Chen | 2016-03-08 |
| 9263535 | Method for fabricating a gate all around device | Jean-Pierre Colinge, Zhiqiang Wu | 2016-02-16 |
| 9257559 | Semiconductor device and formation thereof | Chih-Hao Wang, Zhiqiang Wu, Carlos H. Diaz | 2016-02-09 |
| 9257428 | Structure and method for FinFET device | Ka-Hing Fung, Zhiqiang Wu | 2016-02-09 |
| 9245882 | FinFETs with gradient germanium-containing channels | Zhiqiang Wu, Jiun-Jia Huang, Chao-Hsiung Wang, Chi-Wen Liu | 2016-01-26 |
| 9224849 | Transistors with wrapped-around gates and methods for forming the same | Jean-Pierre Colinge | 2015-12-29 |
| 9224736 | Structure and method for SRAM FinFET device | Ka-Hing Fung, Zhiqiang Wu, Carlos H. Diaz | 2015-12-29 |
| 9219116 | Fin structure of semiconductor device | Chih-Hao Wang, Zhiqiang Wu, Carlos H. Diaz | 2015-12-22 |
| 9209185 | Method and structure for FinFET device | Ka-Hing Fung, Chih-Sheng Chang, Zhiqiang Wu | 2015-12-08 |
| 9209247 | Self-aligned wrapped-around structure | Jean-Pierre Colinge, Ta-Pen Guo, Carlos H. Diaz | 2015-12-08 |
| 9209303 | Structure and method for FinFET device | Ka-Hing Fung, Chih-Sheng Chang, Zhiqiang Wu | 2015-12-08 |
| 9202917 | Buried SiGe oxide FinFET scheme for device enhancement | Chih-Hao Wang, Zhiqiang Wu, Gwan Sin Chang | 2015-12-01 |
| 9196522 | FinFET with buried insulator layer and method for forming | Guan-Lin Chen, Chao-Hsiung Wang, Chi-Wen Liu | 2015-11-24 |
| 9184269 | Silicon and silicon germanium nanowire formation | Carlos H. Diaz, Jean-Pierre Colinge | 2015-11-10 |
| 9178067 | Structure and method for FinFET device | Ka-Hing Fung, Chih-Sheng Chang, Zhiqiang Wu | 2015-11-03 |
| 9171843 | Semiconductor device and fabricating the same | Ting-Hung Hsu | 2015-10-27 |
| 9159833 | Fin structure of semiconductor device | Jiun-Jia Huang, Chao-Hsiung Wang, Chi-Wen Liu | 2015-10-13 |
| 9153668 | Tuning tensile strain on FinFET | Zhi-Chang Lin, Guan-Lin Chen, Ting-Hung Hsu, Jiun-Jia Huang | 2015-10-06 |
| 9153670 | Semiconductor device and fabricating the same | Chih-Hao Wang, Gwan Sin Chang, Zhiqiang Wu | 2015-10-06 |
| 9153657 | Semiconductor devices comprising a fin | Chi-Yuan Chen, Teng-Chun Tsai, Kuo-Yin Lin, Wan-Chun Pan, Hsiang-Pi Chang +3 more | 2015-10-06 |
| 9147682 | Fin spacer protected source and drain regions in FinFETs | Ting-Hung Hsu, Chao-Hsiung Wang, Chi-Wen Liu | 2015-09-29 |
| 9142676 | Semiconductor liner of semiconductor device | Chih-Hao Wang, Carlos H. Diaz | 2015-09-22 |
| 9111784 | Integrate circuit with nanowires | Jiun-Jia Huang | 2015-08-18 |
| 9035277 | Semiconductor device and fabricating the same | Ting-Hung Hsu | 2015-05-19 |