Issued Patents All Time
Showing 251–275 of 342 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9735255 | Method for fabricating a finFET device including a stem region of a fin element | Jean-Pierre Colinge, Zhiqiang Wu | 2017-08-15 |
| 9721955 | Structure and method for SRAM FinFET device having an oxide feature | Ka-Hing Fung, Chih-Sheng Chang, Zhiqiang Wu | 2017-08-01 |
| 9716096 | Semiconductor structure with feature spacer and method for manufacturing the same | Chun-Hsiung Lin, Chih-Hao Wang, Ying-Keung Leung, Carlos H. Diaz | 2017-07-25 |
| 9711533 | FinFET devices having different source/drain proximities for input/output devices and non-input/output devices and the method of fabrication thereof | Ching-Wei Tsai, Chih-Hao Wang, Ying-Keung Leung | 2017-07-18 |
| 9711535 | Method of forming FinFET channel | Chih-Hao Wang, Ching-Wei Tsai, Jhon Jhy Liaw, Wai-Yi Lien | 2017-07-18 |
| 9704861 | Semiconductor device and fabricating the same | Ting-Hung Hsu | 2017-07-11 |
| 9704883 | FETS and methods of forming FETS | Chih-Hao Wang, Ching-Wei Tsai, Chi-Wen Liu, Jhon Jhy Liaw, Wai-Yi Lien | 2017-07-11 |
| 9698058 | Structure and method for FinFET device | Ka-Hing Fung, Chih-Sheng Chang, Zhiqiang Wu | 2017-07-04 |
| 9691621 | Silicide region of gate-all-around transistor | Chi-Wen Liu, Chao-Hsiung Wang | 2017-06-27 |
| 9666581 | FinFET with source/drain structure and method of fabrication thereof | Ching-Wei Tsai, Ying-Keung Leung | 2017-05-30 |
| 9640645 | Semiconductor device with silicide | Jean-Pierre Colinge, Ta-Pen Guo, Carlos H. Diaz | 2017-05-02 |
| 9634091 | Silicon and silicon germanium nanowire formation | Carlos H. Diaz, Jean-Pierre Colinge | 2017-04-25 |
| 9634127 | FinFET device and method for fabricating same | Gwan Sin Chang, Zhiqiang Wu, Chih-Hao Wang | 2017-04-25 |
| 9627476 | Fin structure of semiconductor device | Carlos H. Diaz, Chih-Hao Wang, Zhiqiang Wu | 2017-04-18 |
| 9627264 | Semiconductor device and formation thereof | Guan-Lin Chen | 2017-04-18 |
| 9627385 | Tuning tensile strain on FinFET | Zhi-Chang Lin, Guan-Lin Chen, Ting-Hung Hsu, Jiun-Jia Huang | 2017-04-18 |
| 9608116 | FINFETs with wrap-around silicide and method forming the same | Ching-Wei Tsai, Chi-Wen Liu, Chih-Hao Wang, Ying-Keung Leung | 2017-03-28 |
| 9595443 | Metal gate structure of a semiconductor device | Ming Zhu, Hui-Wen Lin, Harry-Hak-Lay Chuang, Bao-Ru Young, Yuan-Sheng Huang +4 more | 2017-03-14 |
| 9590102 | Semiconductor device and manufacturing method thereof | Ching-Wei Tsai, Chih-Hao Wang, Wai-Yi Lien | 2017-03-07 |
| 9577101 | Source/drain regions for fin field effect transistors and methods of forming same | Chi-Wen Liu | 2017-02-21 |
| 9559184 | Devices including gate spacer with gap or void and methods of forming the same | Ching-Wei Tsai, Chi-Wen Liu, Ying-Keung Leung | 2017-01-31 |
| 9559181 | Structure and method for FinFET device with buried sige oxide | Chih-Hao Wang, Zhiqiang Wu, Carlos H. Diaz | 2017-01-31 |
| 9548362 | High mobility devices with anti-punch through layers and methods of forming same | Ka-Hing Fung, Zhiqiang Wu | 2017-01-17 |
| 9543418 | Semiconductor liner of semiconductor device | Chih-Hao Wang, Carlos H. Diaz | 2017-01-10 |
| 9520498 | FinFET structure and method for fabricating the same | Guan-Lin Chen, Chao-Hsiung Wang, Chi-Wen Liu | 2016-12-13 |