Issued Patents All Time
Showing 1–21 of 21 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9711415 | Device for high-K and metal gate stacks | Jyun-Ming Lin, Wei-Cheng Wu, Sheng-Chen Chung, Bao-Ru Young | 2017-07-18 |
| 9536867 | N/P boundary effect reduction for metal gate transistors | Cheng-Cheng Kuo, Ching-Che Tsai, Ming Zhu, Bao-Ru Young | 2017-01-03 |
| 9257347 | System and method for a field-effect transistor with a raised drain structure | Ming Zhu | 2016-02-09 |
| 9209089 | Method of fabricating a metal gate semiconductor device | Sheng-Chen Chung, Ming Zhu, Jyun-Ming Lin, Bao-Ru Young | 2015-12-08 |
| 9177870 | Enhanced gate replacement process for high-K metal gate technology | Ming Zhu | 2015-11-03 |
| 9123694 | N/P boundary effect reduction for metal gate transistors | Cheng-Cheng Kuo, Ching-Che Tsai, Ming Zhu, Bao-Ru Young | 2015-09-01 |
| 9093559 | Method of hybrid high-k/metal-gate stack fabrication | Jin-Aun Ng, Po-Nien Chen, Sheng-Chen Chung, Bao-Ru Young | 2015-07-28 |
| 8822283 | Self-aligned insulated film for high-k metal gate device | Jin-Aun Ng, Maxi Chang, Jen-Sheng Yang, Ta-Wei Lin, Shih-Hao Lo +8 more | 2014-09-02 |
| 8772114 | Metal gate semiconductor device and method of fabricating thereof | Ming Zhu, Hui-Wen Lin, Bao-Ru Young | 2014-07-08 |
| 8753931 | Cost-effective gate replacement process | Ming Zhu, Jyun-Ming Lin, Wei-Cheng Wu, Bao-Ru Young | 2014-06-17 |
| 8742492 | Device with a vertical gate structure | Ming Zhu, Yi-Ren Chen | 2014-06-03 |
| 8703595 | N/P boundary effect reduction for metal gate transistors | Cheng-Cheng Kuo, Ching-Che Tsai, Ming Zhu, Bao-Ru Young | 2014-04-22 |
| 8698252 | Device for high-K and metal gate stacks | Po-Nien Chen, Jin-Aun Ng, Ming Zhu, Bao-Ru Young | 2014-04-15 |
| 8691673 | Semiconductor structure with suppressed STI dishing effect at resistor region | Ming Zhu, Lee-Wee Teo, Bao-Ru Young | 2014-04-08 |
| 8635573 | Method of fabricating a semiconductor device having a defined minimum gate spacing between adjacent gate structures | Ming Zhu, Po-Nien Chen, Bao-Ru Young | 2014-01-21 |
| 8592945 | Large dimension device and method of manufacturing same in gate last process | Ming Zhu | 2013-11-26 |
| 8546227 | Contact for high-K metal gate device | Sheng-Chen Chung, Wei-Cheng Wu, Bao-Ru Young, Huan-Just Lin, Tsai-Chun Li | 2013-10-01 |
| 8530326 | Method of fabricating a dummy gate structure in a gate last process | Su-Chen Lai, Ming-Yuan Wu, Kong-Beng Thei, Chiung-Han Yeh, Hong-Dyi Chang +3 more | 2013-09-10 |
| 6028003 | Method of forming an interconnect structure with a graded composition using a nitrided target | Larry E. Frisa | 2000-02-22 |
| 5961791 | Process for fabricating a semiconductor device | Larry E. Frisa, Laura Pressley | 1999-10-05 |
| 5958635 | Lithographic proximity correction through subset feature modification | Alfred J. Reich, Michael E. Kling, Paul G. Y. Tsui, Kevin Lucas, James N. Conner | 1999-09-28 |