Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6573010 | Method and apparatus for reducing incidental exposure by using a phase shifter with a variable regulator | Hua-Yu Liu | 2003-06-03 |
| 6566019 | Using double exposure effects during phase shifting to control line end shortening | Hua-Yu Liu | 2003-05-20 |
| 5958635 | Lithographic proximity correction through subset feature modification | Alfred J. Reich, Hak-Lay Chuang, Paul G. Y. Tsui, Kevin Lucas, James N. Conner | 1999-09-28 |
| 5920487 | Two dimensional lithographic proximity correction using DRC shape functions | Alfred J. Reich, Warren D. Grobman, Bernard J. Roman, Kevin Lucas, Clyde Browning | 1999-07-06 |
| 5900340 | One dimensional lithographic proximity correction using DRC shape functions | Alfred J. Reich, Kevin Lucas, Warren D. Grobman, Bernard J. Roman | 1999-05-04 |
| 5849440 | Process for producing and inspecting a lithographic reticle and fabricating semiconductor devices using same | Kevin Lucas, Alfred J. Reich, Chong-Cheng Fu, James Morrow | 1998-12-15 |
| 5827625 | Methods of designing a reticle and forming a semiconductor device therewith | Kevin Lucas, Bernard J. Roman, Alfred J. Reich | 1998-10-27 |