Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6605395 | Method and apparatus for forming a pattern on an integrated circuit using differing exposure characteristics | Warren D. Grobman, Ruoping Wang | 2003-08-12 |
| 6593226 | Method for adding features to a design layout and process for designing a mask | Edward O. Travis, Aykut Dengi, Sejal Chheda, Tat-Kwan Yu, Mark S. Roberton +2 more | 2003-07-15 |
| 5958635 | Lithographic proximity correction through subset feature modification | Hak-Lay Chuang, Michael E. Kling, Paul G. Y. Tsui, Kevin Lucas, James N. Conner | 1999-09-28 |
| 5920487 | Two dimensional lithographic proximity correction using DRC shape functions | Warren D. Grobman, Bernard J. Roman, Kevin Lucas, Clyde Browning, Michael E. Kling | 1999-07-06 |
| 5900340 | One dimensional lithographic proximity correction using DRC shape functions | Kevin Lucas, Michael E. Kling, Warren D. Grobman, Bernard J. Roman | 1999-05-04 |
| 5849440 | Process for producing and inspecting a lithographic reticle and fabricating semiconductor devices using same | Kevin Lucas, Michael E. Kling, Chong-Cheng Fu, James Morrow | 1998-12-15 |
| 5827625 | Methods of designing a reticle and forming a semiconductor device therewith | Kevin Lucas, Michael E. Kling, Bernard J. Roman | 1998-10-27 |