Issued Patents All Time
Showing 76–100 of 153 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7126208 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Motoaki Iwabuchi, Fujio Yagihashi, Yoshitaka Hamada, Hideo Nakagawa | 2006-10-24 |
| 7125643 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2006-10-24 |
| 7125642 | Sulfonates, polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2006-10-24 |
| 7119354 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film | Fujio Yagihashi, Yoshitaka Hamada, Hideo Nakagawa | 2006-10-10 |
| 7094521 | Pattern formation method and exposure system | Masayuki Endo | 2006-08-22 |
| 7084505 | Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor device | Yoshitaka Hamada, Fujio Yagihashi, Hideo Nakagawa | 2006-08-01 |
| 7078147 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Masayuki Endo, Shinji Kishimura | 2006-07-18 |
| 7067231 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2006-06-27 |
| 7060775 | Polymer compound, resist material and pattern formation method | Shinji Kishimura, Masayuki Endo, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara | 2006-06-13 |
| 7041428 | Pattern-forming material and method of forming pattern | Shinji Kishimura, Masayuki Endo, Mitsuru Ueda, Tsuyohiko Fujigaya | 2006-05-09 |
| 7029827 | Pattern formation method | Masayuki Endo | 2006-04-18 |
| 7022466 | Pattern formation method | Masayuki Endo | 2006-04-04 |
| 7011934 | Pattern formation method | Masayuki Endo | 2006-03-14 |
| 7005228 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +4 more | 2006-02-28 |
| 7001707 | Resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2006-02-21 |
| 6992015 | Pattern formation method | Masayuki Endo | 2006-01-31 |
| 6949329 | Pattern formation method | Masayuki Endo | 2005-09-27 |
| 6946235 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2005-09-20 |
| 6936401 | Pattern formation material and pattern formation method | Masayuki Endo | 2005-08-30 |
| 6933095 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +4 more | 2005-08-23 |
| 6930393 | Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor device | Yoshitaka Hamada, Takeshi Asano, Hideo Nakagawa | 2005-08-16 |
| 6916592 | Esters, polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2005-07-12 |
| 6913857 | Exposure mask, method for manufacturing the mask, and exposure method | Masayuki Endo, Tokushige Hisatsugu | 2005-07-05 |
| 6913873 | Pattern formation method | Masayuki Endo | 2005-07-05 |
| 6908729 | Pattern formation method | Masayuki Endo | 2005-06-21 |