Issued Patents All Time
Showing 26–50 of 153 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7731862 | Dry etching method, fine structure formation method, mold and mold fabrication method | Hideo Nakagawa, Tomoyasu Murakami | 2010-06-08 |
| 7727707 | Barrier film material and pattern formation method using the same | Masayuki Endo | 2010-06-01 |
| 7713685 | Exposure system and pattern formation method | Masayuki Endo | 2010-05-11 |
| 7700268 | Exposure system and pattern formation method using the same | Masayuki Endo | 2010-04-20 |
| 7666967 | Ester compound, polymer, resist composition, and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Kazuhiko Maeda +2 more | 2010-02-23 |
| 7655385 | Pattern formation method | Masayuki Endo | 2010-02-02 |
| 7595142 | Pattern formation method | Masayuki Endo | 2009-09-29 |
| 7588876 | Resist material and pattern formation method | Shinji Kishimura, Masayuki Endo, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara | 2009-09-15 |
| 7569323 | Resist protective coating material and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masayuki Endo, Haruhiko Komoriya +3 more | 2009-08-04 |
| 7563709 | Pattern formation method and method for forming semiconductor device | Hideo Nakagawa, Yoshihiko Hirai | 2009-07-21 |
| 7563706 | Material for forming insulating film with low dielectric constant, low dielectric insulating film, method for forming low dielectric insulating film and semiconductor device | Hideo Nakagawa | 2009-07-21 |
| 7556914 | Pattern formation method | Masayuki Endo | 2009-07-07 |
| 7550253 | Barrier film material and pattern formation method using the same | Masayuki Endo | 2009-06-23 |
| 7541132 | Chemically amplified resist material, topcoat film material and pattern formation method using the same | Masayuki Endo | 2009-06-02 |
| 7524772 | Pattern formation method | Masayuki Endo | 2009-04-28 |
| 7488567 | Polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Kazuhiko Maeda +2 more | 2009-02-10 |
| 7470501 | Pattern formation method through liquid immersion lithography | Masayuki Endo | 2008-12-30 |
| 7462438 | Resist material and pattern formation method using the same | Masayuki Endo | 2008-12-09 |
| 7455950 | Resist material and pattern formation method using the same | Masayuki Endo | 2008-11-25 |
| 7413843 | Sulfonamide compound, polymer compound, resist material and pattern formation method | Shinji Kishimura, Masayuki Endo, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara | 2008-08-19 |
| 7405459 | Semiconductor device comprising porous film | Tsutomu Ogihara, Fujio Yagihashi, Hideo Nakagawa | 2008-07-29 |
| 7402621 | Porous-film-forming composition, preparation method of the composition, porous film and semiconductor device | Tsutomu Ogihara, Fujio Yagihashi, Yoshitaka Hamada, Takeshi Anaso, Motoaki Iwabuchi +1 more | 2008-07-22 |
| 7393794 | Pattern formation method | Masayuki Endo | 2008-07-01 |
| 7378229 | Pattern formation method | Masayuki Endo | 2008-05-27 |
| 7378218 | Polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Kazuhiko Maeda +2 more | 2008-05-27 |