Issued Patents All Time
Showing 51–75 of 153 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7378218 | Polymer, resist composition and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Kazuhiko Maeda +2 more | 2008-05-27 |
| 7374857 | Bismide compound, acid generator and resist composition each containing the same, and method of forming pattern from the composition | Tsuneaki Maesawa, Fumiyoshi Urano, Masayuki Endo | 2008-05-20 |
| 7357961 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Motoaki Iwabuchi, Fujio Yagihashi, Yoshitaka Hamada, Takeshi Asano, Hideo Nakagawa | 2008-04-15 |
| 7341775 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Yoshitaka Hamada, Fujio Yagihashi, Hideo Nakagawa | 2008-03-11 |
| 7338743 | Resist material and pattern formation method | Masayuki Endo | 2008-03-04 |
| 7332446 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device | Tsutomu Ogihara, Fujio Yagihashi, Yoshitaka Hamada, Takeshi Asano, Motoaki Iwabuchi +1 more | 2008-02-19 |
| 7314703 | Chemically amplified resist material and pattern formation method using the same | Masayuki Endo | 2008-01-01 |
| 7309722 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Tsutomu Ogihara, Fujio Yagihashi, Hideo Nakagawa | 2007-12-18 |
| 7294571 | Concave pattern formation method and method for forming semiconductor device | Hideo Nakagawa, Yoshihiko Hirai | 2007-11-13 |
| 7291554 | Method for forming semiconductor device | Hideo Nakagawa, Yoshihiko Hirai | 2007-11-06 |
| 7273820 | Method for fabricating semiconductor device | Hideo Nakagawa, Masayuki Endo, Yoshihiko Hirai | 2007-09-25 |
| 7255974 | Pattern formation method | Masayuki Endo | 2007-08-14 |
| 7244657 | Zeolite sol and method for preparing the same, composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Tsutomu Ogihara, Fujio Yagihashi, Hideo Nakagawa | 2007-07-17 |
| 7241553 | Polymer, resist composition, and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2007-07-10 |
| 7239018 | Composition for forming a porous film prepared by hydrolysis and condensation of an alkoxysilane using a trialkylmethylammonium hydroxide catalyst | Yoshitaka Hamada, Fujio Yagihashi, Hideo Nakagawa | 2007-07-03 |
| 7205338 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Tsutomu Ogihara, Fujio Yagihashi, Hideo Nakagawa | 2007-04-17 |
| 7198888 | Water-soluble material, chemically amplified resist and pattern formation method using the same | Masayuki Endo | 2007-04-03 |
| 7195860 | Semiconductor manufacturing apparatus and pattern formation method | Masayuki Endo | 2007-03-27 |
| 7169869 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2007-01-30 |
| 7169530 | Polymer compound, resist material and pattern formation method | Shinji Kishimura, Masayuki Endo, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara | 2007-01-30 |
| 7166418 | Sulfonamide compound, polymer compound, resist material and pattern formation method | Shinji Kishimura, Masayuki Endo, Mitsuru Ueda, Hirokazu Imori, Toshiaki Fukuhara | 2007-01-23 |
| 7135273 | Pattern formation method | Masayuki Endo | 2006-11-14 |
| 7132224 | Pattern formation method | Masayuki Endo | 2006-11-07 |
| 7132473 | Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor device | Tsutomu Ogihara, Fujio Yagihashi, Yoshitaka Hamada, Takeshi Asano, Motoaki Iwabuchi +1 more | 2006-11-07 |
| 7125641 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2006-10-24 |