Issued Patents All Time
Showing 101–125 of 153 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6902999 | Pattern formation method | Masayuki Endo | 2005-06-07 |
| 6875556 | Resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2005-04-05 |
| 6872514 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2005-03-29 |
| 6864037 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +4 more | 2005-03-08 |
| 6861197 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Watanabe, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo +5 more | 2005-03-01 |
| 6855477 | Chemically amplified resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2005-02-15 |
| 6841488 | Pattern formation method | Masayuki Endo | 2005-01-11 |
| 6830869 | Pattern forming material and method of pattern formation | Shinji Kishimura, Masayuki Endo, Mitsuru Ueda, Tsuyohiko Fujigaya | 2004-12-14 |
| 6824955 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2004-11-30 |
| 6806029 | Pattern formation material and pattern formation method | Shinji Kishimura, Masayuki Endo, Mitsuru Ueda, Tsuyohiko Fujigaya | 2004-10-19 |
| 6790586 | Resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Jun Watanabe, Yoshio Kawai, Masayuki Endo +5 more | 2004-09-14 |
| 6764811 | Pattern formation method | Masayuki Endo | 2004-07-20 |
| 6753132 | Pattern formation material and pattern formation method | Shinji Kishimura, Masayuki Endo, Masamitsu Shirai, Masahiro Tsunooka | 2004-06-22 |
| 6737213 | Pattern formation material and method | Shinji Kishimura, Masamitsu Shirai, Masahir Tsunooka | 2004-05-18 |
| 6721390 | Soft X-ray reduction projection exposure system, soft X-ray reduction projection exposure method and pattern formation method | Takahiro Matsuo | 2004-04-13 |
| 6716730 | Pattern formation method | Masayuki Endo | 2004-04-06 |
| 6710148 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Hatakeyama, Jun Watanabe, Yoshio Kawai, Masayuki Endo +5 more | 2004-03-23 |
| 6689536 | Pattern formation material and pattern formation method | Shinji Kishimura, Masayuki Endo, Masamitsu Shirai, Masahiro Tsunooka | 2004-02-10 |
| 6673523 | Pattern formation method | Shinji Kishimura, Akiko Katsuyama | 2004-01-06 |
| 6660447 | Polymers, resist compositions and patterning process | Jun Hatakeyama, Yuji Harada, Jun Watanabe, Masayuki Endo, Shinji Kishimura | 2003-12-09 |
| 6645694 | Pattern formation material and pattern formation method | Shinji Kishimura, Masayuki Endo, Masamitsu Shirai, Masahiro Tsunooka | 2003-11-11 |
| 6632582 | Pattern formation material and pattern formation method | Shinji Kishimura, Mitsuru Ueda | 2003-10-14 |
| 6603037 | Ester compounds | Yuji Harada, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo, Shinji Kishimura +3 more | 2003-08-05 |
| 6582880 | Polymers, resist compositions and patterning process | Yuji Harada, Jun Watanabe, Jun Hatakeyama, Yoshio Kawai, Masayuki Endo +5 more | 2003-06-24 |
| 6576398 | Pattern formation material and method | Shinji Kishimura, Masamitsu Shirai, Masahiro Tsunooka | 2003-06-10 |