Issued Patents All Time
Showing 51–75 of 75 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8236593 | Methods for improving the quality of epitaxially-grown semiconductor materials | Subhash Mahajan, Ilsu Han | 2012-08-07 |
| 8197597 | Gallium trichloride injection scheme | Christiaan J. Werkhoven | 2012-06-12 |
| 8178427 | Epitaxial methods for reducing surface dislocation density in semiconductor materials | Laurent Clavelier, Marc Rabarot | 2012-05-15 |
| 8154022 | Process for fabricating a structure for epitaxy without an exclusion zone | Fabrice Letertre | 2012-04-10 |
| 7902045 | Process for fabricating a structure for epitaxy without an exclusion zone | Fabrice Letertre | 2011-03-08 |
| 7816236 | Selective deposition of silicon-containing films | Matthias Bauer, Ronald Thomas Bertram, JR., Pierre Tomasini, Nyles Wynn Cody, Paul Brabant +3 more | 2010-10-19 |
| 7785995 | Semiconductor buffer structures | Nyles Wynn Cody, Pierre Tomasini, Carlos Mazure | 2010-08-31 |
| 7732306 | Methods for producing improved epitaxial materials | Subhash Mahajan, Ranjan Datta | 2010-06-08 |
| 7682947 | Epitaxial semiconductor deposition methods and structures | Paul Brabant, Joseph P. Italiano, Pierre Tomasini, Ivo Raaijmakers, Matthias Bauer | 2010-03-23 |
| 7666799 | Epitaxial growth of relaxed silicon germanium layers | Pierre Tomasini, Nyles Wynn Cody, Matthias Bauer | 2010-02-23 |
| 7625814 | Filling deep features with conductors in semiconductor manufacturing | Ismail Emesh, Bulent M. Basol | 2009-12-01 |
| 7514372 | Epitaxial growth of relaxed silicon germanium layers | Pierre Tomasini, Nyles Wynn Cody, Matthias Bauer | 2009-04-07 |
| 7452757 | Silicon-on-insulator structures and methods | Christiaan J. Werkhoven, Ivo Raaijmakers | 2008-11-18 |
| 7427556 | Method to planarize and reduce defect density of silicon germanium | Pierre Tomasini, Nyles Wynn Cody | 2008-09-23 |
| 7402504 | Epitaxial semiconductor deposition methods and structures | Paul Brabant, Joseph P. Italiano, Pierre Tomasini, Ivo Raaijmakers, Matthias Bauer | 2008-07-22 |
| 7396415 | Apparatus and methods for isolating chemical vapor reactions at a substrate surface | Chris Werkhoven, Ron Bertram | 2008-07-08 |
| 7238595 | Epitaxial semiconductor deposition methods and structures | Paul Brabant, Joseph P. Italiano, Pierre Tomasini, Ivo Raaijmakers, Matthias Bauer | 2007-07-03 |
| 7115521 | Epitaxial semiconductor deposition methods and structures | Paul Brabant, Joseph P. Italiano, Pierre Tomasini, Ivo Raaijmakers, Matthias Bauer | 2006-10-03 |
| 7022593 | SiGe rectification process | Pierre Tomasini, Nyles Wynn Cody | 2006-04-04 |
| 6998305 | Enhanced selectivity for epitaxial deposition | Joe P. Italiano, Paul Brabant | 2006-02-14 |
| 6121140 | Method of improving surface morphology and reducing resistivity of chemical vapor deposition-metal films | Ronald Thomas Bertram, JR., Emmanuel Guidotti, Joseph T. Hillman | 2000-09-19 |
| 6090705 | Method of eliminating edge effect in chemical vapor deposition of a metal | Ronald Thomas Bertram, JR., Emmanuel Guidotti, Joseph T. Hillman | 2000-07-18 |
| 5972790 | Method for forming salicides | Robert F. Foster, Joseph T. Hillman, Michael S. Ameen, Jacques Faguet | 1999-10-26 |
| 5635093 | Heating plate for heating an object placed on its surface and chemical treatment reactor equipped with said plate | Patrice Noel | 1997-06-03 |
| 5232508 | Gaseous phase chemical treatment reactor | Jean-Pierre Joly, Patrice Noel, Michel Papapietro | 1993-08-03 |