Issued Patents All Time
Showing 26–50 of 53 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 8852844 | Composition for forming silicon-containing film, silicon-containing film-formed substrate and patterning process | Tsutomu Ogihara, Toshiharu Yano | 2014-10-07 |
| 8835102 | Patterning process and composition for forming silicon-containing film usable therefor | Tsutomu Ogihara, Toshiharu Yano | 2014-09-16 |
| 8759220 | Patterning process | Tsutomu Ogihara, Seiichiro Tachibana, Yoshinori Taneda, Martin Glodde, Margaret C. Lawson +1 more | 2014-06-24 |
| 8715913 | Silicon-containing resist underlayer film-forming composition and patterning process | Tsutomu Ogihara, Fujio Yagihashi | 2014-05-06 |
| 8697330 | Composition for forming a silicon-containing antireflection film, substrate having the silicon-containing antireflection film from the composition and patterning process using the same | Tsutomu Ogihara, Toshiharu Yano | 2014-04-15 |
| 8652267 | Coated-type silicon-containing film stripping process | Tsutomu Ogihara, Toshiharu Yano, Shozo Shirai | 2014-02-18 |
| 8501386 | Silicon-containing film-forming composition, silicon-containing film-formed substrate, and patterning process | Tsutomu Ogihara, Toshiharu Yano, Koji Hasegawa | 2013-08-06 |
| 8343711 | Patterning process | Tsutomu Ogihara, Toshiharu Yano | 2013-01-01 |
| 8329376 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Tsutomu Ogihara, Motoaki Iwabuchi | 2012-12-11 |
| 8043610 | Freeze-dried composition of inactivated virus envelope with membrane fusion activity | — | 2011-10-25 |
| 8029974 | Metal oxide-containing film-forming composition, metal oxide-containing film-formed substrate, and patterning process | Tsutomu Ogihara, Toshiharu Yano | 2011-10-04 |
| 8026038 | Metal oxide-containing film-forming composition, metal oxide-containing film, metal oxide-containing film-bearing substrate, and patterning method | Tsutomu Ogihara, Toshiharu Yano, Mutsuo Nakashima | 2011-09-27 |
| 7910283 | Silicon-containing antireflective coating forming composition, silicon-containing antireflective coating, substrate processing intermediate, and substrate processing method | Tsutomu Ogihara, Motoaki Iwabuchi, Takeshi Asano | 2011-03-22 |
| 7868407 | Substrate comprising a lower silicone resin film and an upper silicone resin film | Tsutomu Ogihara | 2011-01-11 |
| 7855043 | Silicon-containing film-forming composition, silicon-containing film, silicon-containing film-bearing substrate, and patterning method | Tsutomu Ogihara, Takeshi Asano, Motoaki Iwabuchi | 2010-12-21 |
| 7678529 | Silicon-containing film forming composition, silicon-containing film serving as etching mask, substrate processing intermediate, and substrate processing method | Tsutomu Ogihara, Takeshi Asano, Motoaki Iwabuchi | 2010-03-16 |
| 7642043 | Rework process for photoresist film | Tsutomu Ogihara | 2010-01-05 |
| 7638268 | Rework process for photoresist film | Tsutomu Ogihara | 2009-12-29 |
| 7585613 | Antireflection film composition, substrate, and patterning process | Tsutomu Ogihara, Motoaki Iwabuchi, Takeshi Asano | 2009-09-08 |
| 7541134 | Antireflective film-forming composition, method for manufacturing the same, and antireflective film and pattern formation method using the same | Motoaki Iwabuchi, Yoshitaka Hamada, Tsutomu Ogihara, Takeshi Asano, Dirk Pfeiffer | 2009-06-02 |
| 7485690 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | Yoshitaka Hamada, Tsutomu Ogihara, Motoaki Iwabuchi, Takeshi Asano, Dirk Pfeiffer | 2009-02-03 |
| 7417104 | Porous film-forming composition, patterning process, and porous sacrificial film | Motoaki Iwabuchi, Yoshitaka Hamada, Tsutomu Ogihara, Takeshi Asano | 2008-08-26 |
| 7385021 | Sacrificial film-forming composition, patterning process, sacrificial film and removal method | Yoshitaka Hamada, Tsutomu Ogihara, Motoaki Iwabuchi, Takeshi Asano | 2008-06-10 |
| 7163778 | Anti-reflection film material and a substrate having an anti-reflection film and a method for forming a pattern | Jun Hatakeyama, Tsutomu Ogihara, Motoaki Iwabuchi | 2007-01-16 |
| 6590010 | Organosiloxane polymer, photo-curable resin composition, patterning process, and substrate protective coating | Hideto Kato, Tomoyoshi Furihata | 2003-07-08 |