DK

Daisuke KORI

SC Shin-Etsu Chemical Co.: 69 patents #37 of 2,176Top 2%
HI Hitachi: 19 patents #1,906 of 28,497Top 7%
📍 Joetsu, JP: #15 of 239 inventorsTop 7%
Overall (All Time): #18,581 of 4,157,543Top 1%
88
Patents All Time

Issued Patents All Time

Showing 26–50 of 88 patents

Patent #TitleCo-InventorsDate
10998197 Polymer and composition for forming organic film, substrate for manufacturing semiconductor apparatus, method for forming organic film, and patterning process Tsutomu Ogihara, Takeru Watanabe, Keisuke NIIDA, Takashi SAWAMURA 2021-05-04
10811247 Method of cleaning and drying semiconductor substrate Tsutomu Ogihara, Osamu Watanabe, Takeshi Nagata, Naoki Kobayashi 2020-10-20
10620537 Resist underlayer film composition, patterning process, method for forming resist underlayer film, and compound for resist underlayer film composition Takeru Watanabe, Rie Kikuchi, Yusuke Biyajima, Tsutomu Ogihara 2020-04-14
10615045 Composition for forming organic film, patterning process, and resin for forming organic film Tsutomu Ogihara 2020-04-07
10444628 Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process Tsutomu Ogihara, Takeru Watanabe, Yoshinori Taneda, Kazunori Maeda 2019-10-15
10429739 Compound for forming organic film, composition for forming organic film, method for forming organic film, and patterning process Tsutomu Ogihara, Takeru Watanabe, Yoshinori Taneda, Rie Kikuchi 2019-10-01
10416563 Resist underlayer film composition, patterning process, and method for forming resist underlayer film Hironori Satoh, Hiroko Nagai, Takeru Watanabe, Tsutomu Ogihara 2019-09-17
10243430 Rotating electrical machine with rotor and stator, with a stator core including packet cores Ryuichiro Iwano, Masanori SAWAHATA, Kazuo Nishihama, Motonobu Iizuka, Takayuki Koyama +1 more 2019-03-26
10241412 Resist underlayer film composition, patterning process, and method for forming resist underlayer film Hiroko Nagai, Takeru Watanabe, Tsutomu Ogihara 2019-03-26
10228621 Underlayer film-forming composition and pattern forming process Jun Hatakeyama, Tsutomu Ogihara 2019-03-12
10177621 Rotating electric machine or wind power generation system Naoki Kunihiro, Motonobu Iizuka, Tetsuo Fujigaki, Atsushi Fukunaga, Yasunori Otsuki +6 more 2019-01-08
10156788 Resist underlayer film composition, patterning process, and compound Jun Hatakeyama, Tsutomu Ogihara 2018-12-18
10075112 Field winding type synchronous machine Motonobu Iizuka, Takayuki Koyama 2018-09-11
10047244 Method for producing a composition for forming an organic film Tsutomu Ogihara, Motoaki Iwabuchi 2018-08-14
10007183 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process Seiichiro Tachibana, Tsutomu Ogihara, Takeru Watanabe, Kazumi Noda, Toshiharu Yano 2018-06-26
9984878 Resist under layer film composition and patterning process Jun Hatakeyama 2018-05-29
9977330 Compound for forming organic film, and organic film composition using the same, process for forming organic film, and patterning process Seiichiro Tachibana, Tsutomu Ogihara, Takeru Watanabe, Kazumi Noda, Toshiharu Yano 2018-05-22
9899218 Resist under layer film composition and patterning process Jun Hatakeyama, Takeru Watanabe 2018-02-20
9893593 Rotating electric machine having a cooling frame with a plurality of coolants Shinji Sugimoto, Yuji Kanazawa, Hirotaka Kinoshita 2018-02-13
9857686 Composition for forming resist underlayer film and patterning process Tsutomu Ogihara, Jun Hatakeyama, Naoki Kobayashi 2018-01-02
9798242 Rinse solution for pattern formation and pattern forming process Jun Hatakeyama, Tsutomu Ogihara 2017-10-24
9785049 Method for forming multi-layer film and patterning process Jun Hatakeyama 2017-10-10
9728420 Organic film composition, process for forming organic film, patterning process, and compound Kazumi Noda, Kazunori Maeda, Rie Kikuchi, Tsutomu Ogihara 2017-08-08
9632416 Rinse solution for pattern formation and pattern forming process Jun Hatakeyama, Tsutomu Ogihara 2017-04-25
9624356 Ultraviolet absorber, composition for forming a resist under layer film, and patterning process Tsutomu Ogihara 2017-04-18