Issued Patents All Time
Showing 26–41 of 41 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6706646 | Spin-on glass composition and method of forming silicon oxide layer in semiconductor manufacturing process using the same | Jung-Ho Lee, Jung-Sik Choi, Hong Ki Kim, Dong-Jun Lee, Dae-Won Kang | 2004-03-16 |
| 6682876 | Thinner composition and method of stripping a photoresist using the same | Seung-Hyun Ahn, Hoe-Sik Chung, Mi-sook Jeon, Eun-Mi Bae, Baik-Soon Choi +2 more | 2004-01-27 |
| 6655042 | System and method for drying semiconductor substrate | Hun-Jung Yi, Ki Seok Lee, Bo-yong Lee, Sang-Oh Park, Pil-Kwon Jun +1 more | 2003-12-02 |
| 6590378 | Real time parameter monitoring apparatus for high voltage chamber in semiconductor wafer processing system | Gyeong-Su Keum, Hyung-Sik Hong | 2003-07-08 |
| 6589719 | Photoresist stripper compositions | Seung-Hyun Ahn, Hoe-Sik Chung, Mi-sook Jeon, Eun-Mi Bae, Baik-Soon Choi +1 more | 2003-07-08 |
| 6528333 | Method of and device for detecting micro-scratches | Chung-Sam Jun, Sang-bong Choi, Hyung-Suk Cho, Pil-Sik Hyun, Kyu-Hong Lim +1 more | 2003-03-04 |
| 6515293 | Method and apparatus for detecting thickness of thin layer formed on a wafer | Chung-Sam Jun, Sang-bong Choi, Hyun Suk Cho, Pil-Sik Hyun | 2003-02-04 |
| 6508887 | Resist removing composition and resist removing method using the same | Dong-Jin Park, June-ing Gil, Je-eung Park | 2003-01-21 |
| 6503682 | Photoresist composition, preparation method thereof and method for forming a pattern during semiconductor processing using the photoresist composition | Young-Ho Kim, Hoe-Sik Chung, Boo Sup Lee | 2003-01-07 |
| 6449037 | Method of and device for detecting micro-scratches | Chung-Sam Jun, Sang-bong Choi, Hyung-Suk Cho, Pil-Sik Hyun, Kyu-Hong Lim +1 more | 2002-09-10 |
| 6440760 | Method of measuring etched state of semiconductor wafer using optical impedence measurement | Hyung-Suk Cho, Sang-bong Choi, Chung-sam Chun, Min-Sub Kang | 2002-08-27 |
| 6398874 | Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same | Dong-Jin Park, Jin Ho Hwang, June-ing Gil, Je-eung Park | 2002-06-04 |
| 6274537 | Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same | Dong-Jin Park, Jin Ho Hwang, June-ing Gil, Je-eung Park | 2001-08-14 |
| 6165841 | Method for fabricating capacitors with hemispherical grains | Dong Won Kim, Doo-Heun Beak, Jeong-kon Kim | 2000-12-26 |
| 6137018 | Chemical refining method and reuse system for semiconductor device manufacturing | Yong-Kyun Ko, June-ing Gil | 2000-10-24 |
| 5846921 | Semiconductor substrate cleaning solutions, methods of forming the same, and methods using the same | June-ing Gil, Seok-ho Yi, Ho-Kyoon Chung | 1998-12-08 |