Issued Patents All Time
Showing 1–7 of 7 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6508887 | Resist removing composition and resist removing method using the same | Dong-Jin Park, Je-eung Park, Sang-Mun Chon | 2003-01-21 |
| 6398874 | Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same | Dong-Jin Park, Jin Ho Hwang, Je-eung Park, Sang-Mun Chon | 2002-06-04 |
| 6337174 | Method of stripping a photoresist from a semiconductor substrate dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide | Mi-sook Jeon, Chun-Deuk Lee, Pil-Kwon Jun | 2002-01-08 |
| 6274537 | Use of alkoxy N-hydroxyalkyl alkanamide as resist removing agent, composition for removing resist, method for preparing the same and resist removing method using the same | Dong-Jin Park, Jin Ho Hwang, Je-eung Park, Sang-Mun Chon | 2001-08-14 |
| 6207358 | Method of stripping a photoresist from a semiconductor substrate using dimethylacetamide or a combination of monoethanolamine and dimethylsulfoxide | Mi-sook Jeon, Chun-Deuk Lee, Pil-Kwon Jun | 2001-03-27 |
| 6137018 | Chemical refining method and reuse system for semiconductor device manufacturing | Yong-Kyun Ko, Sang-Mun Chon | 2000-10-24 |
| 5846921 | Semiconductor substrate cleaning solutions, methods of forming the same, and methods using the same | Seok-ho Yi, Sang-Mun Chon, Ho-Kyoon Chung | 1998-12-08 |