Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Systems and methods for vapor delivery in a substrate processing system

Systems and methods for vapor delivery in a substrate processing system

US Patent 9970108 · Granted May 15, 2018

Estimated economic value: $34,519,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Process module chamber providing symmetric RF return path2025
Plasma enhanced atomic layer deposition of silicon-containing films2025
Semiconductor processing device2025
Dynamic precursor dosing for atomic layer deposition2025
Modulated atomic layer deposition2025
Modulated atomic layer deposition2025
In-situ control of film properties during atomic layer deposition2025
Multi-station semiconductor processing with independently adjustable pedestals2025
Multi-station semiconductor processing with independently adjustable pedestals2025
Impurity reduction in silicon-containing films2025
Determining substrate precession with acoustic signals2025
Eddy current monitoring to detect vibration in polishing2025