Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures

Method and apparatus for growing thin oxide films on silicon while minimizing impact on existing structures

US Patent 8236706 · Granted Aug 7, 2012

Estimated economic value: $830,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Pulsing control match network and generator2025
Systems and methods for thermal processing and temperature measurement of a work2025
Apparatus and method for measuring pedestal voltage uniformity in plasma process2025
Enhanced ignition in inductively coupled plasmas for workpiece processing2025
Inductive broad-band sensors for electromagnetic waves2025
Retractable pool fountain2025
Plasma non-uniformity detection2024
Variable mode plasma chamber utilizing tunable plasma potential2024
Sector shunts for plasma-based wafer processing systems2024
Enhanced ignition in inductively coupled plasmas for workpiece processing2023
Inductive broad-band sensors for electromagnetic waves2023
Fast arc detecting match network2023