Patent Leaderboard
USPTO Patent Rankings Data through Dec 31, 2025
Home › Materials for chemical mechanical polishing

Materials for chemical mechanical polishing

US Patent 7179159 · Granted Feb 20, 2007

Estimated economic value: $75,472,000 ⓘ

Assignee

Inventors

View full patent text on Google Patents →

More Patents by These Inventors

Rain guard system mountable to a vehicle2025
System and method to map thickness variations of substrates in manufacturing sys2025
Polishing articles and integrated system and methods for manufacturing chemical 2024
Techniques for combining CMP process tracking data with 3D printed CMP consumabl2024
CMP pad construction with composite material properties using additive manufactu2024
Spray system for slurry reduction during chemical mechanical polishing (cmp)2023
Spray system for slurry reduction during chemical mechanical polishing (cmp)2023
Platen surface modification and high-performance pad conditioning to improve CMP2023
Parameter sensing and computer modeling for gas delivery health monitoring2023
Polishing pads produced by an additive manufacturing process2023
Retaining ring for CMP2023
Retaining ring for CMP2023