Issued Patents All Time
Showing 26–50 of 74 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6798516 | Projection exposure apparatus having compact substrate stage | — | 2004-09-28 |
| 6677088 | Photomask producing method and apparatus and device manufacturing method | Naomasa Shiraishi | 2004-01-13 |
| 6650421 | Method and apparatus for inspecting optical device | — | 2003-11-18 |
| 6583853 | Method of measuring exposure condition in projection exposure apparatus | Osamu Furukawa | 2003-06-24 |
| 6538740 | Adjusting method for position detecting apparatus | Naomasa Shiraishi | 2003-03-25 |
| 6356343 | Mark for position detection and mark detecting method and apparatus | Naomasa Shiraishi | 2002-03-12 |
| 6319641 | Scanning exposure method utilizing alignment marks based on scanning direction | — | 2001-11-20 |
| 6320195 | Exposure apparatus, method of making the apparatus, exposure method, and device and manufacturing method of the device | — | 2001-11-20 |
| 6284416 | Photo mask and exposure method using same | Naomasa Shiraishi, Shigeru Hirukawa | 2001-09-04 |
| 6278957 | Alignment method and apparatus therefor | Masahiko Yasuda, Osamu Furukawa, Masaharu Kawakubo, Hiroki Tateno | 2001-08-21 |
| 6265119 | Method for producing semiconductor devices | — | 2001-07-24 |
| 6221540 | Photomask and projection exposure apparatus | Hiroshi Onoda | 2001-04-24 |
| 6160619 | Projection exposure apparatus having compact substrate stage | — | 2000-12-12 |
| 6141107 | Apparatus for detecting a position of an optical mark | Kenji Nishi, Masaharu Kawakubo | 2000-10-31 |
| 6132908 | Photo mask and exposure method using the same | Naomasa Shiraishi, Shigeru Hirukawa | 2000-10-17 |
| 6124933 | Exposure apparatus utilizing surface position detection, method thereof, and semiconductor device production method using the apparatus | Hideo Mizutani, Naoyuki Kobayashi | 2000-09-26 |
| 6118516 | Projection exposure apparatus having a filter arranged in its projection optical system and method for protecting circuit patterns | Nobuyuki Irie, Yasuaki Tanaka, Naomasa Shiraishi, Shigeru Hirukawa | 2000-09-12 |
| 6078380 | Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure | Tetsuo Taniguchi, Naomasa Shiraishi | 2000-06-20 |
| 5981117 | Scanning exposure method utilizing identical scan direction across multiple mask pattern layers | — | 1999-11-09 |
| 5966201 | Mark for position detection, and mark detecting method and apparatus | Naomasa Shiraishi | 1999-10-12 |
| 5907405 | Alignment method and exposure system | Shinji Mizutani | 1999-05-25 |
| 5805866 | Alignment method | Shinji Mizutani | 1998-09-08 |
| 5801835 | Surface position detection apparatus and method | Hideo Mizutani, Naoyuki Kobayashi | 1998-09-01 |
| 5774240 | Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques | Akihiro Goto, Takashi Genma, Yutaka Ichihara, Naomasa Shiraishi, Toshio Matsuura +2 more | 1998-06-30 |
| 5754300 | Alignment method and apparatus | Kazuya Ohta, Hiroki Tateno | 1998-05-19 |