Issued Patents All Time
Showing 51–75 of 133 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7012251 | Electron beam apparatus, a pattern evaluation method and a device manufacturing method using the electron beam apparatus or pattern evaluation method | Takao Kato, Toshifumi Kimba, Tohru Satake | 2006-03-14 |
| 7005641 | Electron beam apparatus and a device manufacturing method by using said electron beam apparatus | Takao Kato, Nobuharu Noji, Tohru Satake, Takeshi Murakami, Kenji Watanabe | 2006-02-28 |
| 6998611 | Electron beam apparatus and device manufacturing method using same | Takao Kato, Kenji Watanabe, Shoji Yoshikawa, Tohru Satake, Nobuharu Noji | 2006-02-14 |
| 6992290 | Electron beam inspection system and inspection method and method of manufacturing devices using the system | Kenji Watanabe, Hirosi Sobukawa, Nobuharu Noji, Tohru Satake, Shoji Yoshikawa +7 more | 2006-01-31 |
| 6855929 | Apparatus for inspection with electron beam, method for operating same, and method for manufacturing semiconductor device using former | Toshifumi Kimba, Tohru Satake, Tsutomu Karimata, Kenji Watanabe, Nobuharu Noji +6 more | 2005-02-15 |
| 6853143 | Electron beam system and method of manufacturing devices using the system | Takao Kato, Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji | 2005-02-08 |
| 6831281 | Methods and devices for detecting and canceling magnetic fields external to a charged-particle-beam (CPB) optical system, and CPB microlithography apparatus and methods comprising same | — | 2004-12-14 |
| 6707240 | Electron gun and electron beam exposure device | Kazuya Okamoto | 2004-03-16 |
| 6614034 | Charged-particle-beam microlithography apparatus and methods including shielding of the beam from extraneous magnetic fields | — | 2003-09-02 |
| 6608317 | Charged-particle-beam (CPB)-optical systems with improved shielding against stray magnetic fields, and CPB microlithography apparatus comprising same | — | 2003-08-19 |
| 6593152 | Electron beam apparatus and method of manufacturing semiconductor device using the apparatus | Tohru Satake, Kenji Watanabe, Takeshi Murakami, Nobuharu Noji, Hirosi Sobukawa +9 more | 2003-07-15 |
| 6591412 | Methods for dividing a pattern in a segmented reticle for charged-particle-beam microlithography | — | 2003-07-08 |
| 6565633 | Electron beam treatment apparatus of flue gas and boiler system with the same apparatus | — | 2003-05-20 |
| 6541785 | Electron-beam sources and electron-beam microlithography apparatus comprising same | — | 2003-04-01 |
| 6538255 | Electron gun and electron-beam optical systems and methods including detecting and adjusting transverse beam-intensity profile, and device manufacturing methods including same | — | 2003-03-25 |
| 6525324 | Charged-particle-beam projection optical system | — | 2003-02-25 |
| 6487063 | Electrostatic wafer chuck, and charged-particle-beam microlithography apparatus and methods comprising same | — | 2002-11-26 |
| 6465783 | High-throughput specimen-inspection apparatus and methods utilizing multiple parallel charged particle beams and an array of multiple secondary-electron-detectors | — | 2002-10-15 |
| 6444399 | Methods for achieving reduced effects of overlayer and subfield-stitching errors in charged-particle-beam microlithography, and device manufacturing methods comprising such microlithography methods | — | 2002-09-03 |
| 6429441 | Charged-particle-beam microlithography apparatus and methods exhibiting variable beam velocity, and device-manufacturing methods using same | — | 2002-08-06 |
| 6388261 | Charged-particle-beam microlithography apparatus and methods exhibiting reduced astigmatisms and linear distortion | — | 2002-05-14 |
| 6352799 | Charged-particle-beam pattern-transfer methods and apparatus including beam-drift measurement and correction, and device manufacturing methods comprising same | — | 2002-03-05 |
| 6337164 | Charged-particle-beam microlithography methods exhibiting improved pattern-feature accuracy, and device manufacturing methods comprising same | — | 2002-01-08 |
| 6326633 | Device fabrication methods using charged-particle-beam image-transfer apparatus exhibiting reduced space-charge effects | — | 2001-12-04 |
| 6307209 | Pattern-transfer method and apparatus | Teruaki Okino | 2001-10-23 |