Issued Patents All Time
Showing 76–100 of 133 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6300023 | Microlithographic pattern-transfer methods for large segmented reticles, and device manufacturing methods using same | — | 2001-10-09 |
| 6284415 | Charged-particle-beam transfer masks and methods of making | — | 2001-09-04 |
| 6235450 | Pattern formation methods combining light lithography and electron-beam lithography and manufacturing methods using the same | — | 2001-05-22 |
| 6218676 | Charged-particle-beam image-transfer apparatus exhibiting reduced space-charge effects and device fabrication methods using the same | — | 2001-04-17 |
| 6194102 | Pattern-transfer methods and masks | Koichi Kamijo | 2001-02-27 |
| 6162581 | Charged particle beam pattern-transfer method utilizing non-uniform dose distribution in stitching region | Teruaki Okino | 2000-12-19 |
| 6153340 | Charged-particle-beam microlithography methods and reticles for same exhibiting reduced space-charge and proximity effects | — | 2000-11-28 |
| 6140021 | Charged particle beam transfer method | Shintaro Kawata | 2000-10-31 |
| 6125522 | Manufacturing method for electrostatic deflector | — | 2000-10-03 |
| 6124596 | Charged-particle-beam projection apparatus and transfer methods | Shohei Suzuki | 2000-09-26 |
| 6117600 | Charged-particle-beam transfer methods utilizing high and low resolution sub-patterns | — | 2000-09-12 |
| 6114709 | Electron-beam transfer-exposure apparatus and method | — | 2000-09-05 |
| 6110626 | Segmented stencil masks with main field and side fields containing complementary subfields, and methods for using same | — | 2000-08-29 |
| 6110627 | Charged-particle-beam transfer methods exhibiting reduced resist-heating effects | — | 2000-08-29 |
| 6087046 | Methods for forming microlithographic masks that compensate for proximity effects | — | 2000-07-11 |
| 6087667 | Charged-particle-beam (CPB) lithography apparatus, evaluation method, and CPB source | Shintaro Kawata | 2000-07-11 |
| 6083648 | Microlithography reticle exhibiting reduced stresses and methods for manufacturing same | Shin Takahashi | 2000-07-04 |
| 6078382 | Charged-particle-beam projection-optical system | — | 2000-06-20 |
| 6078054 | Charged particle beam optical system | — | 2000-06-20 |
| 6066853 | Electron-optical system exhibiting reduced aberration | — | 2000-05-23 |
| 6064071 | Charged-particle-beam optical systems | — | 2000-05-16 |
| 6059981 | Fiducial marks for charged-particle-beam exposure apparatus and methods for forming same | — | 2000-05-09 |
| 6051917 | Electron beam gun | — | 2000-04-18 |
| 6015643 | Mask used in charged particle beam projecting apparatus | — | 2000-01-18 |
| 6011268 | Demagnifying projection-optical system for electron beam lithography with aberration control | — | 2000-01-04 |