Issued Patents All Time
Showing 76–100 of 143 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7699598 | Conforming template for patterning liquids disposed on substrates | Byung-Jin Choi, Ronald D. Voisin | 2010-04-20 |
| 7691313 | Method for expelling gas positioned between a substrate and a mold | Byung-Jin Choi, Ian McMackin, Pankaj Lad | 2010-04-06 |
| 7670529 | Method and system for double-sided patterning of substrates | Byung-Jin Choi | 2010-03-02 |
| 7670530 | Patterning substrates employing multiple chucks | Byung-Jin Choi | 2010-03-02 |
| 7670953 | Positive tone bi-layer method | — | 2010-03-02 |
| 7635445 | Method of separating a mold from a solidified layer disposed on a substrate | Byung-Jin Choi, Anshuman Cherala, Yeong-Jun Choi, Mario Johannes Meissl, Norman E. Schumaker +3 more | 2009-12-22 |
| 7547504 | Pattern reversal employing thick residual layers | — | 2009-06-16 |
| 7535549 | System and method for improvement of alignment and overlay for microlithography | Anshuman Cherala, Kranthimitra Adusumilli | 2009-05-19 |
| 7491637 | Formation of conductive templates employing indium tin oxide | Ian McMackin, Byung-Jin Choi, Ronald D. Voisin | 2009-02-17 |
| 7442336 | Capillary imprinting technique | Byung-Jin Choi, Michael Watts | 2008-10-28 |
| 7432634 | Remote center compliant flexure device | Byung-Jin Choi, Stephen C. Johnson | 2008-10-07 |
| 7420654 | Method of varying dimensions of a substrate during nano-scale manufacturing | Anshuman Cherala, Byung-Jin Choi, Pawan Kumar Nimmakayala, Mario Johannes Meissl | 2008-09-02 |
| 7396475 | Method of forming stepped structures employing imprint lithography | — | 2008-07-08 |
| 7374415 | Apparatus to control displacement of a body spaced-apart from a surface | Byung-Jin Choi, Stephen C. Johnson | 2008-05-20 |
| 7357876 | Eliminating printability of sub-resolution defects in imprint lithography | — | 2008-04-15 |
| 7323417 | Method of forming a recessed structure employing a reverse tone process | — | 2008-01-29 |
| 7323130 | Magnification correction employing out-of-plane distortion of a substrate | Pawan Kumar Nimmakayala, Byung-Jin Choi, Anshuman Cherala | 2008-01-29 |
| 7307697 | Adaptive shape substrate support system | Mahadevan GanapathiSubramanian | 2007-12-11 |
| 7303383 | Imprint lithography system to produce light to impinge upon and polymerize a liquid in superimposition with template overlay marks | Byung-Jin Choi, Matthew E. Colburn, Todd C. Bailey | 2007-12-04 |
| 7298456 | System for varying dimensions of a substrate during nanoscale manufacturing | Anshuman Cherala, Byung-Jin Choi, Pawan Kumar Nimmakayala, Mario Johannes Meissl | 2007-11-20 |
| 7279113 | Method of forming a compliant template for UV imprinting | Michael Watts, Ronald D. Voisin | 2007-10-09 |
| 7261831 | Positive tone bi-layer imprint lithography method | — | 2007-08-28 |
| 7261830 | Applying imprinting material to substrates employing electromagnetic fields | Anshuman Cherala, Norman E. Schumaker | 2007-08-28 |
| 7259833 | Substrate support method | Pawan Kumar Nimmakayala | 2007-08-21 |
| 7252777 | Method of forming an in-situ recessed structure | David A. Vidusek, David C. Wang | 2007-08-07 |