Issued Patents All Time
Showing 126–143 of 143 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6990870 | System for determining characteristics of substrates employing fluid geometries | Byung-Jin Choi | 2006-01-31 |
| 6986975 | Method of aligning a template with a substrate employing moire patterns | Byung-Jin Choi, Matthew E. Colburn, Todd C. Bailey | 2006-01-17 |
| 6982783 | Chucking system for modulating shapes of substrates | Byung-Jin Choi, Ronald D. Voisin, Michael Watts, Daniel Babbs, Mario Johannes Meissl +2 more | 2006-01-03 |
| 6980282 | Method for modulating shapes of substrates | Byung-Jin Choi, Ronald D. Voisin, Michael Watts, C. Grant Willson, Norman E. Schumaker +1 more | 2005-12-27 |
| 6964793 | Method for fabricating nanoscale patterns in light curable compositions using an electric field | Carlton G. Willson, Roger T. Bonnecaze | 2005-11-15 |
| 6955868 | Method to control the relative position between a body and a surface | Byung-Jin Choi, Stephen C. Johnson | 2005-10-18 |
| 6926929 | System and method for dispensing liquids | Michael Watts, Byung-Jin Choi | 2005-08-09 |
| 6922906 | Apparatus to orientate a body with respect to a surface | Byung-Jin Choi, Stephen C. Johnson | 2005-08-02 |
| 6921615 | High-resolution overlay alignment methods for imprint lithography | Byung-Jin Choi, Matthew E. Colburn, Todd C. Bailey | 2005-07-26 |
| 6916584 | Alignment methods for imprint lithography | Michael Watts, Byung-Jin Choi, Ronald D. Voisin | 2005-07-12 |
| 6916585 | Method of varying template dimensions to achieve alignment during imprint lithography | Byung-Jin Choi, Matthew E. Colburn, Todd C. Bailey | 2005-07-12 |
| 6908861 | Method for imprint lithography using an electric field | Roger T. Bonnecaze, Carlton G. Willson | 2005-06-21 |
| 6902853 | Dual wavelength method of determining a relative position of a substrate and a template | Byung-Jin Choi, Matthew E. Colburn, Todd C. Bailey | 2005-06-07 |
| 6900881 | Step and repeat imprint lithography systems | Michael Watts, Byung-Jin Choi, Mario Johannes Meissl, Norman E. Schumaker, Ronald D. Voisin | 2005-05-31 |
| 6871558 | Method for determining characteristics of substrate employing fluid geometries | Byung-Jin Choi | 2005-03-29 |
| 6873087 | High precision orientation alignment and gap control stages for imprint lithography processes | Byung-Jin Choi, Stephen C. Johnson | 2005-03-29 |
| 6870301 | Method of separating a template from a substrate during imprint lithography | Byung-Jin Choi, Stephen C. Johnson | 2005-03-22 |
| 6842229 | Imprint lithography template comprising alignment marks | Byung-Jin Choi, Matthew E. Colburn, Todd C. Bailey | 2005-01-11 |