Issued Patents All Time
Showing 26–50 of 143 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 9415418 | Programmable deposition of thin films of a user-defined profile with nanometer scale accuracy | Shrawan Singhal | 2016-08-16 |
| 9223202 | Method of automatic fluid dispensing for imprint lithography processes | Byung-Jin Choi, Carlton G. Willson, Mattherw E. Colburn, Todd C. Bailey, John Ekerdt | 2015-12-29 |
| 9196765 | Nanostructured solar cell | Shuqiang Yang, Michael Nevin Miller, Mohamed M. Hilali, Fen Wan, Gerard Schmid +2 more | 2015-11-24 |
| 9070803 | Nanostructured solar cell | Shuqiang Yang, Michael Nevin Miller, Mohamed M. Hilali, Fen Wan, Gerard Schmid +2 more | 2015-06-30 |
| 8980751 | Methods and systems of material removal and pattern transfer | Gerard Schmid, Michael Nevin Miller, Byung-Jin Choi, Douglas J. Resnick, Frank Y. Xu +1 more | 2015-03-17 |
| 8968620 | Safe separation for nano imprinting | Se-Hyuk Im, Mahadevan GanapathiSubramanian, Edward Brian Fletcher, Niyaz Khusnatdinov, Gerard Schmid +4 more | 2015-03-03 |
| 8961800 | Functional nanoparticles | Shuqiang Yang, Frank Y. Xu, Vikramjit Singh | 2015-02-24 |
| 8916200 | Nanoimprint lithography formation of functional nanoparticles using dual release layers | Vikramjit Singh, Frank Y. Xu | 2014-12-23 |
| 8877073 | Imprint lithography template | Gerard Schmid, Douglas J. Resnick, Frank Y. Xu | 2014-11-04 |
| 8865046 | Imprinting of partial fields at the edge of the wafer | Byung-Jin Choi | 2014-10-21 |
| 8850980 | Tessellated patterns in imprint lithography | Philip D. Schumaker, Ian McMackin | 2014-10-07 |
| 8828297 | Patterning of non-convex shaped nanostructures | Vikramjit Singh, Frank Y. Xu, Byung-Jin Choi | 2014-09-09 |
| 8808808 | Method for imprint lithography utilizing an adhesion primer layer | Frank Y. Xu, Edward Brian Fletcher | 2014-08-19 |
| 8802747 | Nanoimprint lithography processes for forming nanoparticles | Frank Y. Xu, Shuqiang Yang | 2014-08-12 |
| 8609326 | Methods for exposure for the purpose of thermal management for imprint lithography processes | Byung-Jin Choi | 2013-12-17 |
| 8556616 | Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template | Douglas J. Resnick, Mario Johannes Meissl, Byung-Jin Choi | 2013-10-15 |
| 8545709 | Critical dimension control during template formation | Cynthia B. Brooks, Dwayne L. LaBrake, Niyaz Khusnatdinov, Michael Nevin Miller, David J. Lentz +1 more | 2013-10-01 |
| 8529778 | Large area patterning of nano-sized shapes | Shuqiang Yang, Frank Y. Xu, Dwayne L. LaBrake | 2013-09-10 |
| 8394282 | Adaptive nanotopography sculpting | Avinash Panga | 2013-03-12 |
| 8387482 | Method and system to control movement of a body for nano-scale manufacturing | Byung-Jin Choi | 2013-03-05 |
| 8349241 | Method to arrange features on a substrate to replicate features having minimal dimensional variability | Michael Watts | 2013-01-08 |
| 8334967 | Substrate support system having a plurality of contact lands | Pawan Kumar Nimmakayala | 2012-12-18 |
| 8318066 | Step and repeat imprint lithography process | Byung-Jin Choi, Norman E. Schumaker, Ronald D. Voisin, Michael Watts, Mario Johannes Meissl | 2012-11-27 |
| 8282383 | Method for expelling gas positioned between a substrate and a mold | Byung-Jin Choi, Ian McMackin, Pankaj Lad | 2012-10-09 |
| 8187515 | Large area roll-to-roll imprint lithography | Shrawan Singhal, Byung-Jin Choi, Ian McMackin | 2012-05-29 |