Issued Patents All Time
Showing 1,226–1,250 of 1,397 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6051823 | Method and apparatus to compensate for non-uniform film growth during chemical vapor deposition | — | 2000-04-18 |
| 6043450 | Method to compensate for non-uniform film growth during chemical vapor deposition | — | 2000-03-28 |
| 6040245 | IC mechanical planarization process incorporating two slurry compositions for faster material removal times | Richard L. Elliott, Trung T. Doan, Jody D. Larsen | 2000-03-21 |
| 6040020 | Method of forming a film having enhanced reflow characteristics at low thermal budget | Randhir P. S. Thakur | 2000-03-21 |
| 6040010 | Catalytic breakdown of reactant gases in chemical vapor deposition | Anand Srinivasan | 2000-03-21 |
| 6027970 | Method of increasing capacitance of memory cells incorporating hemispherical grained silicon | Sujit Sharan, Thomas A. Figura, Anand Srinivasan | 2000-02-22 |
| 6025269 | Method for depositioning a substantially void-free aluminum film over a refractory metal nitride layer | — | 2000-02-15 |
| 6025220 | Method of forming a polysilicon diode and devices incorporating such diode | — | 2000-02-15 |
| 6017789 | Method of forming a Ta.sub.2 O.sub.5 dielectric layer with amorphous diffusion barrier layer and method of forming a capacitor having a b. Ta.su2 O.sub.5 dielectric layer with amorphous diffusion barrier layer | Pierre C. Fazan | 2000-01-25 |
| 6007408 | Method and apparatus for endpointing mechanical and chemical-mechanical polishing of substrates | — | 1999-12-28 |
| 6004196 | Polishing pad refurbisher for in situ, real-time conditioning and cleaning of a polishing pad used in chemical-mechanical polishing of microelectronic substrates | Trung T. Doan | 1999-12-21 |
| 6001675 | Method of forming a thin film transistor | Shubneesh Batra, Pierre C. Fazan | 1999-12-14 |
| 5997634 | Method of forming a crystalline phase material | Sujit Sharan | 1999-12-07 |
| 5994224 | IC mechanical planarization process incorporating two slurry compositions for faster material removal times | Richard L. Elliott, Trung T. Doan, Jody D. Larsen | 1999-11-30 |
| 5985375 | Method for pulsed-plasma enhanced vapor deposition | Kevin G. Donohoe | 1999-11-16 |
| 5985714 | Method of forming a capacitor | Paul J. Schuele, Wayne Kinney | 1999-11-16 |
| 5985767 | Facet etch for improved step coverage of integrated circuit contacts | Ceredig Roberts, Anand Srinivasan, Sujit Sharan | 1999-11-16 |
| 5985770 | Method of depositing silicon oxides | Ravi Iyer | 1999-11-16 |
| 5977581 | Dielectric material and process to create same | Randhir P. S. Thakur | 1999-11-02 |
| 5976976 | Method of forming titanium silicide and titanium by chemical vapor deposition | Trung T. Doan, Kirk D. Prall, Sujit Sharan | 1999-11-02 |
| 5975994 | Method and apparatus for selectively conditioning a polished pad used in planarizng substrates | Trung T. Doan | 1999-11-02 |
| 5965932 | Contamination free source for shallow low energy junction implants using implanted molecules containing titanium and boron | Mohammed Anjum | 1999-10-12 |
| 5966615 | Method of trench isolation using spacers to form isolation trenches with protected corners | Pierre C. Fazan, Martin C. Roberts | 1999-10-12 |
| 5963835 | Method of forming aluminum film | Ravi Iyer | 1999-10-05 |
| 5963832 | Removal of metal cusp for improved contact fill | Anand Srinivasan, Sujit Sharan | 1999-10-05 |