Issued Patents All Time
Showing 1,176–1,200 of 1,397 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6198124 | Method of forming a Ta2O5 dielectric layer, method of forming a capacitor having a Ta2O5 dielectric layer, and capacitor construction | Pierre C. Fazan | 2001-03-06 |
| 6190992 | Method to achieve rough silicon surface on both sides of container for enhanced capacitance/area electrodes | Randhir P. S. Thakur | 2001-02-20 |
| 6191864 | Method and apparatus for detecting the endpoint in chemical-mechanical polishing of semiconductor wafers | — | 2001-02-20 |
| 6188097 | Rough electrode (high surface area) from Ti and TiN | Garo Derderian | 2001-02-13 |
| 6187673 | Small grain size, conformal aluminum interconnects and method for their formation | Wing-Cheong Gilbert Lai | 2001-02-13 |
| 6177145 | Semiconductor processing method of making electrical contact to a node | Garo Derderian | 2001-01-23 |
| 6174816 | Treatment for film surface to reduce photo footing | Zhiping Yin | 2001-01-16 |
| 6171943 | Methods of forming a contact having titanium silicide formed by chemical vapor deposition | Trung T. Doan, Kirk D. Prall, Sujit Sharan | 2001-01-09 |
| 6165834 | Method of forming capacitors, method of processing dielectric layers, method of forming a DRAM cell | Vishnu K. Agarwal, Garo Derderian | 2000-12-26 |
| 6162499 | Method of inhibiting deposition of material on an internal wall of a chemical vapor deposition reactor | Ravi Iyer, Donald L. Westmoreland | 2000-12-19 |
| 6159867 | RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition | Sujit Sharan, Paul Smith, Mei Chang | 2000-12-12 |
| 6150029 | Method of forming a film having enhanced reflow characteristics at low thermal budget | Randhir P. S. Thakur | 2000-11-21 |
| 6147011 | Methods of forming dielectric layers and methods of forming capacitors | Garo Derderian | 2000-11-14 |
| 6144095 | Metallization layer | Chris C. Yu | 2000-11-07 |
| 6143362 | Chemical vapor deposition of titanium | Donald L. Westmoreland | 2000-11-07 |
| 6137180 | Low cost DRAM metallization | Sujit Sharan | 2000-10-24 |
| 6133600 | Memory device with improved domed capacitors | — | 2000-10-17 |
| 6132514 | Catalytic breakdown of reactant gases in chemical vapor deposition | Anand Srinivasan | 2000-10-17 |
| 6127732 | Semiconductor device having high aspect ratio contacts | Shubneesh Batra | 2000-10-03 |
| 6124607 | Capacitive memory cell | Randhir P. S. Thakur | 2000-09-26 |
| 6124626 | Capacitor structures formed using excess oxygen containing material provided relative to electrodes thereof | Garo Derderian | 2000-09-26 |
| 6120347 | System for real-time control of semiconductor wafer polishing | Trung T. Doan | 2000-09-19 |
| 6120354 | Method of chemical mechanical polishing | Daniel A. Koos, Sung-Cheol Kim | 2000-09-19 |
| 6112697 | RF powered plasma enhanced chemical vapor deposition reactor and methods | Sujit Sharan, Paul Smith | 2000-09-05 |
| 6114735 | Field effect transistors and method of forming field effect transistors | Shubneesh Batra | 2000-09-05 |