Issued Patents All Time
Showing 1,151–1,175 of 1,397 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6245674 | Method of forming a metal silicide comprising contact over a substrate | — | 2001-06-12 |
| 6245631 | Method of forming buried bit line memory circuitry and semiconductor processing method of forming a conductive line | Vishnu K. Agarwal, Ravi Iyer | 2001-06-12 |
| 6245191 | Wet etch apparatus | Garo Derderian | 2001-06-12 |
| 6243534 | Method and apparatus to compensate for non-uniform film growth during chemical vapor deposition | — | 2001-06-05 |
| 6238994 | Method of creating a rough electrode (high surface area) from Ti and TiN and resulting article | Garo Derderian | 2001-05-29 |
| 6238957 | Method of forming a thin film transistor | Shubneesh Batra, Pierre C. Fazan | 2001-05-29 |
| 6235646 | RF powered plasma enhanced chemical vapor deposition reactor and methods of effecting plasma enhanced chemical vapor deposition | Sujit Sharan, Paul Smith, Mei Chang | 2001-05-22 |
| 6234877 | Method of chemical mechanical polishing | Daniel A. Koos, Sung-Cheol Kim | 2001-05-22 |
| 6232580 | Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes | — | 2001-05-15 |
| 6229157 | Method of forming a polysilicon diode and devices incorporating such diode | — | 2001-05-08 |
| 6227141 | RF powered plasma enhanced chemical vapor deposition reactor and methods | Sujit Sharan, Paul Smith | 2001-05-08 |
| 6218288 | Multiple step methods for forming conformal layers | Weimin Li | 2001-04-17 |
| 6218237 | Method of forming a capacitor | Pierre C. Fazan | 2001-04-17 |
| 6214726 | Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same | Trung T. Doan | 2001-04-10 |
| 6214687 | Method of forming a capacitor and a capacitor construction | Pierre C. Fazan | 2001-04-10 |
| 6211033 | Integrated capacitor bottom electrode for use with conformal dielectric | J. Brett Rolfson | 2001-04-03 |
| 6211093 | Laser ablative removal of photoresist | Shubneesh Batra | 2001-04-03 |
| 6208425 | Endpoint detector and method for measuring a change in wafer thickness in chemical-mechanical polishing of semiconductor wafers | Trung T. Doan | 2001-03-27 |
| 6208033 | Apparatus having titanium silicide and titanium formed by chemical vapor deposition | Trung T. Doan, Kirk D. Prall, Sujit Sharan | 2001-03-27 |
| 6204149 | Methods of forming polished material and methods of forming isolation regions | Shubneesh Batra | 2001-03-20 |
| 6204175 | Method of depositing a smooth conformal aluminum film on a refractory metal nitride layer | Gilbert Lai, Ravi Iyer, Brian A. Vaartstra | 2001-03-20 |
| 6204196 | Method of forming a film having enhanced reflow characteristics at low thermal budget | Randhir P. S. Thakur | 2001-03-20 |
| 6201219 | Chamber and cleaning process therefor | Ravi Iyer, Donald L. Westmoreland | 2001-03-13 |
| 6200874 | Methods for use in forming a capacitor | Garo Derderian | 2001-03-13 |
| 6201276 | Method of fabricating semiconductor devices utilizing in situ passivation of dielectric thin films | Vishnu K. Agarwal, Garo Derderian | 2001-03-13 |