GS

Gurtej S. Sandhu

Micron: 1369 patents #1 of 6,345Top 1%
RR Round Rock Research: 13 patents #7 of 239Top 3%
Applied Materials: 7 patents #1,721 of 7,310Top 25%
OT Ovonyx Memory Technology: 4 patents #11 of 30Top 40%
MI Mosaid Technologies Incorporated: 1 patents #115 of 170Top 70%
IN Intel: 1 patents #18,218 of 30,777Top 60%
LG Lodestar Licensing Group: 1 patents #26 of 80Top 35%
📍 Boise, ID: #1 of 3,546 inventorsTop 1%
🗺 Idaho: #1 of 8,810 inventorsTop 1%
Overall (All Time): #34 of 4,157,543Top 1%
1397
Patents All Time

Issued Patents All Time

Showing 1,101–1,125 of 1,397 patents

Patent #TitleCo-InventorsDate
6368988 Combined gate cap or digit line and spacer deposition using HDP Weimin Li, Sujit Sharan 2002-04-09
6368986 Use of selective ozone TEOS oxide to create variable thickness layers and spacers William Budge, Christopher W. Hill 2002-04-09
6365486 Method of fabricating semiconductor devices utilizing in situ passivation of dielectric thin films Vishnu K. Agarwal, Garo Derderian 2002-04-02
6362114 Semiconductor processing methods of forming an oxynitride film on a silicon substrate Pierre C. Fazan 2002-03-26
6362088 Method of forming ohmic conductive components in a single chamber process Sujit Sharan 2002-03-26
6358801 Method and apparatus for trench isolation process with pad gate and trench edge spacer elimination Pierre C. Fazan 2002-03-19
6358756 Self-aligned, magnetoresistive random-access memory (MRAM) structure utilizing a spacer containment scheme Roger Lee, Dennis Keller, Trung T. Doan, Max Hineman, Ren Earl 2002-03-19
6355561 ALD method to improve surface coverage Garo Derderian 2002-03-12
6348706 Method to form etch and/or CMP stop layers 2002-02-19
6344376 Method of forming a thin film transistor Shubneesh Batra, Pierre C. Fazan 2002-02-05
6342417 Methods of forming materials comprising tungsten and nitrogen Vishnu K. Agarwal 2002-01-29
6340499 Method to increase gas residence time in a reactor Ravi Iyer, Sujit Sharan 2002-01-22
6338667 System for real-time control of semiconductor wafer polishing Trung T. Doan 2002-01-15
6337237 Capacitor processing method and DRAM processing method Cem Basceri 2002-01-08
6335282 Method of forming a titanium comprising layer and method of forming a conductive silicide contact Sujit Sharan 2002-01-01
6333556 Insulating materials Werner Juengling, Kirk D. Prall, Ravi Iyer, Guy T. Blalock 2001-12-25
6333256 Semiconductor processing method of forming openings in a material Shubneesh Batra 2001-12-25
6331379 Photo-lithography process using multiple anti-reflective coatings Philip J. Ireland, Thomas R. Glass 2001-12-18
6323085 High coupling split-gate transistor and method for its formation Sukesh Sandhu 2001-11-27
6319856 Methods of forming dielectric layers and methods of forming capacitors Garo Derderian 2001-11-20
6319764 Method of forming haze-free BST films Cem Basceri 2001-11-20
6313035 Chemical vapor deposition using organometallic precursors Pierre C. Fazan 2001-11-06
6313046 Method of forming materials between conductive electrical components, and insulating materials Werner Juengling, Kirk D. Prall, Ravi Iyer, Guy T. Blalock 2001-11-06
6312486 Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto Donald L. Westmoreland, Daniel A. Koos 2001-11-06
6306766 Method of forming a crystalline phase material, electrically conductive line and refractory metal silicide Chris Hill, Sujit Sharan 2001-10-23