GS

Gurtej S. Sandhu

Micron: 1369 patents #1 of 6,345Top 1%
RR Round Rock Research: 13 patents #7 of 239Top 3%
Applied Materials: 7 patents #1,721 of 7,310Top 25%
OT Ovonyx Memory Technology: 4 patents #11 of 30Top 40%
MI Mosaid Technologies Incorporated: 1 patents #115 of 170Top 70%
IN Intel: 1 patents #18,218 of 30,777Top 60%
LG Lodestar Licensing Group: 1 patents #26 of 80Top 35%
📍 Boise, ID: #1 of 3,546 inventorsTop 1%
🗺 Idaho: #1 of 8,810 inventorsTop 1%
Overall (All Time): #34 of 4,157,543Top 1%
1397
Patents All Time

Issued Patents All Time

Showing 1,201–1,225 of 1,397 patents

Patent #TitleCo-InventorsDate
6110820 Low scratch density chemical mechanical planarization process Sujit Sharan 2000-08-29
6106677 Method of creating low resistance contacts in high aspect ratio openings by resputtering 2000-08-22
6107183 Method of forming an interlevel dielectric Anand Srinivasan, Ravi Iyer 2000-08-22
6107686 Interlevel dielectric structure Anand Srinivasan, Ravi Iyer 2000-08-22
6108092 Method and apparatus for detecting the endpoint in chemical-mechanical polishing of semiconductor wafers 2000-08-22
6107105 Amorphous tin films for an integrated capacitor dielectric/bottom plate using high dielectric constant material 2000-08-22
6107157 Method and apparatus for trench isolation process with pad gate and trench edge spacer elimination Pierre C. Fazan 2000-08-22
6103570 Method of forming capacitors having an amorphous electrically conductive layer Kris K. Brown 2000-08-15
6099604 Slurry with chelating agent for chemical-mechanical polishing of a semiconductor wafer and methods related thereto Donald L. Westmoreland, Daniel A. Koos 2000-08-08
6091150 Integrated circuitry comprising electrically insulative material over interconnect line tops, sidewalls and bottoms Ravi Iyer 2000-07-18
6090708 Method of forming a crystalline phase material, electrically conductive line and refractory metal silicide Chris Hill, Sujit Sharan 2000-07-18
6090707 Method of forming a conductive silicide layer on a silicon comprising substrate and method of forming a conductive silicide contact Sujit Sharan, Terry L. Gilton 2000-07-18
6090670 Highly efficient transistor for fast programming of flash memories Pierre C. Fazan 2000-07-18
6086442 Method of forming field emission devices Sujit Sharan 2000-07-11
6085689 Apparatus to increase gas residence time in a reactor Ravi Iyer, Sujit Sharan 2000-07-11
6084302 Barrier layer cladding around copper interconnect lines 2000-07-04
6083568 Method of reducing carbon incorporation into films produced by chemical vapor deposition involving organic precursor compounds 2000-07-04
6081034 Low-resistance contact to silicon having a titanium silicide interface and an amorphous titanium carbonitride barrier layer Trung T. Doan, Tyler Lowrey 2000-06-27
6077754 Methods of forming a silicon nitride film, a capacitor dielectric layer and a capacitor Anand Srinivasan, Sujit Sharan 2000-06-20
6077732 Method of forming a thin film transistor Shubneesh Batra, Pierre C. Fazan 2000-06-20
6066553 Semiconductor processing method of forming electrically conductive interconnect lines and integrated circuitry Ravi Iyer 2000-05-23
6066528 Method for forming a capacitor compatible with high dielectric constant materials having two independent insulative layers Pierre C. Fazan 2000-05-23
6064800 Apparatus for uniform gas and radiant heat dispersion for solid state fabrication processes 2000-05-16
6063700 Method of forming ohmic conductive components in a single chamber process Sujit Sharan 2000-05-16
6054191 Method of forming an electrical contact to a silicon substrate Sujit Sharan 2000-04-25