GS

Gurtej S. Sandhu

Micron: 1369 patents #1 of 6,345Top 1%
RR Round Rock Research: 13 patents #7 of 239Top 3%
Applied Materials: 7 patents #1,721 of 7,310Top 25%
OT Ovonyx Memory Technology: 4 patents #11 of 30Top 40%
MI Mosaid Technologies Incorporated: 1 patents #115 of 170Top 70%
IN Intel: 1 patents #18,218 of 30,777Top 60%
LG Lodestar Licensing Group: 1 patents #26 of 80Top 35%
📍 Boise, ID: #1 of 3,546 inventorsTop 1%
🗺 Idaho: #1 of 8,810 inventorsTop 1%
Overall (All Time): #34 of 4,157,543Top 1%
1397
Patents All Time

Issued Patents All Time

Showing 1,276–1,300 of 1,397 patents

Patent #TitleCo-InventorsDate
5851135 System for real-time control of semiconductor wafer polishing Trung T. Doan 1998-12-22
5849628 Method of producing rough polysilicon by the use of pulsed plasma chemical vapor deposition and products produced by same Trung T. Doan 1998-12-15
5846881 Low cost DRAM metallization Sujit Sharan 1998-12-08
5842909 System for real-time control of semiconductor wafer polishing including heater Trung T. Doan 1998-12-01
5844318 Aluminum film for semiconductive devices Ravi Iyer 1998-12-01
5837564 Method for optimal crystallization to obtain high electrical performance from chalcogenides Alan R. Reinberg 1998-11-17
5824365 Method of inhibiting deposition of material on an internal wall of a chemical vapor deposition reactor Ravi Iyer, Donald L. Westmoreland 1998-10-20
5814852 Method of forming a Ta.sub.2 O.sub.5 dielectric layer, method of forming a capacitor having a Ta.sub.2 O.sub.5 dielectric layer, and capacitor construction Pierre C. Fazan 1998-09-29
5812360 Capacitor construction having an amorphous electrically conductive layer Kris K. Brown 1998-09-22
5800617 Method to deposit highly conformal CVD films 1998-09-01
5789317 Low temperature reflow method for filling high aspect ratio contacts Shubneesh Batra 1998-08-04
5777739 Endpoint detector and method for measuring a change in wafer thickness in chemical-mechanical polishing of semiconductor wafers Trung T. Doan 1998-07-07
5776836 Self aligned method to define features smaller than the resolution limit of a photolithography system 1998-07-07
5773363 Semiconductor processing method of making electrical contact to a node Garo Derderian 1998-06-30
5762537 System for real-time control of semiconductor wafer polishing including heater Trung T. Doan 1998-06-09
5753543 Method of forming a thin film transistor Shubneesh Batra, Pierre C. Fazan 1998-05-19
5754390 Integrated capacitor bottom electrode for use with conformal dielectric J. Brett Rolfson 1998-05-19
5751896 Method and apparatus to compensate for non-uniform film growth during chemical vapor deposition 1998-05-12
RE35785 Low-pressure chemical vapor deposition process for depositing high-density highly-conformal, titanium nitride films of low bulk resistivity Todd W. Buley 1998-05-05
5747116 Method of forming an electrical contact to a silicon substrate Sujit Sharan 1998-05-05
5741546 Method of depositing titanium nitride films on semiconductor wafers 1998-04-21
5738562 Apparatus and method for planar end-point detection during chemical-mechanical polishing Trung T. Doan, Malcolm Grief 1998-04-14
5735960 Apparatus and method to increase gas residence time in a reactor Ravi Iyer, Sujit Sharan 1998-04-07
5733383 Spacers used to form isolation trenches with improved corners Pierre C. Fazan, Martin C. Roberts 1998-03-31
5730835 Facet etch for improved step coverage of integrated circuit contacts Ceredig Roberts, Anand Srinivasan, Sujit Sharan 1998-03-24