GS

Gurtej S. Sandhu

Micron: 1369 patents #1 of 6,345Top 1%
RR Round Rock Research: 13 patents #7 of 239Top 3%
Applied Materials: 7 patents #1,721 of 7,310Top 25%
OT Ovonyx Memory Technology: 4 patents #11 of 30Top 40%
MI Mosaid Technologies Incorporated: 1 patents #115 of 170Top 70%
IN Intel: 1 patents #18,218 of 30,777Top 60%
LG Lodestar Licensing Group: 1 patents #26 of 80Top 35%
📍 Boise, ID: #1 of 3,546 inventorsTop 1%
🗺 Idaho: #1 of 8,810 inventorsTop 1%
Overall (All Time): #34 of 4,157,543Top 1%
1397
Patents All Time

Issued Patents All Time

Showing 951–975 of 1,397 patents

Patent #TitleCo-InventorsDate
6767806 METHOD OF FORMING A PATTERNED SUBSTANTIALLY CRYSTALLINE TA2O5 COMPRISING MATERIAL, AND METHOD OF FORMING A CAPACITOR HAVING A CAPACITOR DIELECTRIC REGION COMPRISING SUBSTANTIALLY CRYSTALLINE TA2O5 COMPRISING MATERIAL Cem Basceri, Garo Derderian, Mark Visokay, John M. Drynan 2004-07-27
6764956 Methods of treating dielectric materials Trung T. Doan 2004-07-20
6765250 Self-aligned, trenchless mangetoresitive random-access memory (MRAM) structure with sidewall containment of MRAM structure Trung T. Doan, Roger Lee, Dennis Keller, Ren Earl 2004-07-20
6762924 Capacitor compatible with high dielectric constant materials having two independent insulative layers and the method for forming same Pierre C. Fazan 2004-07-13
6762450 Method of forming a capacitor and a capacitor construction Pierre C. Fazan 2004-07-13
6759306 Methods of forming silicon dioxide layers and methods of forming trench isolation regions Sujit Sharan 2004-07-06
6759705 Platinum-rhodium stack as an oxygen barrier in an integrated circuit capacitor Haining Yang 2004-07-06
6756293 Combined gate cap or digit line and spacer deposition using HDP Weimin Li, Sujit Sharan 2004-06-29
6753254 Method for forming a metallization layer Chris C. Yu 2004-06-22
6753271 Atomic layer deposition methods Demetrius Sarigiannis, Garo Derderian, Cem Basceri, F. Daniel Gealy, Chris M. Carlson 2004-06-22
6752912 Laser selection of ions for sputter deposition of titanium containing films 2004-06-22
6750089 Methods of forming conductive interconnects Trung T. Doan, Howard E. Rhodes, Sujit Sharan, Philip J. Ireland, Martin C. Roberts 2004-06-15
6749717 Device for in-situ cleaning of an inductively-coupled plasma chambers Sujit Sharan 2004-06-15
6746934 Atomic layer doping apparatus and method Trung T. Doan 2004-06-08
6743736 Reactive gaseous deposition precursor feed apparatus Allen Mardian 2004-06-01
6739944 System for real-time control of semiconductor wafer polishing Trung T. Doan 2004-05-25
6740554 Methods to form rhodium-rich oxygen barriers Haining Yang, Dan Gealy, Howard E. Rhodes, Mark Visokay 2004-05-25
6737328 Methods of forming silicon dioxide layers, and methods of forming trench isolation regions Sujit Sharan 2004-05-18
6734518 Surface treatment of DARC films to reduce defects in subsequent cap layers Zhiping Yin 2004-05-11
6734051 Plasma enhanced chemical vapor deposition methods of forming titanium silicide comprising layers over a plurality of semiconductor substrates Cem Basceri, Irina Vasilyeva, Ammar Derraa, Philip Campbell 2004-05-11
6730355 Chemical vapor deposition method of forming a material over at least two substrates Ammar Derraa, Cem Basceri, Irina Vasilyeva, Philip Campbell 2004-05-04
6730367 Atomic layer deposition method with point of use generated reactive gas species 2004-05-04
6727173 Semiconductor processing methods of forming an utilizing antireflective material layers, and methods of forming transistor gate stacks Sujit Sharan 2004-04-27
6727190 Method of forming fluorine doped boron-phosphorous silicate glass (F-BPSG) insulating materials Anand Srinivasan, Ravi Iyer 2004-04-27
6727140 Capacitor with high dielectric constant materials and method of making Cem Basceri, Sam Yang 2004-04-27