JD

John M. Drynan

Micron: 24 patents #745 of 6,345Top 15%
NE Nec: 8 patents #1,742 of 14,502Top 15%
Overall (All Time): #108,537 of 4,157,543Top 3%
33
Patents All Time

Issued Patents All Time

Showing 25 most recent of 33 patents

Patent #TitleCo-InventorsDate
9123786 Interconnect line selectively isolated from an underlying contact plug 2015-09-01
8796815 Interconnect line selectively isolated from an underlying contact plug 2014-08-05
7888774 Interconnect line selectively isolated from an underlying contact plug 2011-02-15
7573087 Interconnect line selectively isolated from an underlying contact plug 2009-08-11
7535112 Semiconductor constructions comprising multi-level patterns of radiation-imageable material John Reuben Aiton, Joseph M. Richards, J. Brett Rolfson 2009-05-19
7517786 Methods of forming wire bonds for semiconductor constructions John Reuben Aiton, Joseph M. Richards, J. Brett Roltson 2009-04-14
7321150 Semiconductor device precursor structures to a double-sided capacitor or a contact Fred Fishburn, Forest Chen 2008-01-22
7285814 Dynamic random access memory circuitry and integrated circuitry Thomas A. Figura 2007-10-23
7273779 Method of forming a double-sided capacitor Fred Fishburn, Forest Chen 2007-09-25
7268039 Method of forming a contact using a sacrificial structure Fred Fishburn, Forest Chen 2007-09-11
7262123 Methods of forming wire bonds for semiconductor constructions John Reuben Aiton, Joseph M. Richards, J. Brett Rolfson 2007-08-28
7061115 Interconnect line selectively isolated from an underlying contact plug 2006-06-13
7053462 Planarization of metal container structures Sam Yang 2006-05-30
7019347 Dynamic random access memory circuitry comprising insulative collars Thomas A. Figura 2006-03-28
6969882 Interconnect line selectively isolated from an underlying contact plug 2005-11-29
6962846 Methods of forming a double-sided capacitor or a contact using a sacrificial structure Fred Fishburn, Forest Chen 2005-11-08
6861713 Integrated circuitry comprising insulative collars and integrated circuitry comprising sidewall spacers over a conductive line projecting outwardly from a first insulative material Thomas A. Figura 2005-03-01
6781182 Interconnect line selectively isolated from an underlying contact plug 2004-08-24
6767806 METHOD OF FORMING A PATTERNED SUBSTANTIALLY CRYSTALLINE TA2O5 COMPRISING MATERIAL, AND METHOD OF FORMING A CAPACITOR HAVING A CAPACITOR DIELECTRIC REGION COMPRISING SUBSTANTIALLY CRYSTALLINE TA2O5 COMPRISING MATERIAL Cem Basceri, Garo Derderian, Mark Visokay, Gurtej S. Sandhu 2004-07-27
6713378 Interconnect line selectively isolated from an underlying contact plug 2004-03-30
6645846 Methods of forming conductive contacts to conductive structures Thomas A. Figura 2003-11-11
6617250 Methods of depositing a layer comprising tungsten and methods of forming a transistor gate line Cem Basceri, Garo Derderian, Mark Visokay, Gurtej S. Sandhu 2003-09-09
6524912 Planarization of metal container structures Sam Yang 2003-02-25
6511896 Method of etching a substantially amorphous TA2O5 comprising layer Cem Basceri, Garo Derderian, Mark Visokay, Gurtej S. Sandhu 2003-01-28
6511879 Interconnect line selectively isolated from an underlying contact plug 2003-01-28