Issued Patents All Time
Showing 51–75 of 180 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6961186 | Contact printing using a magnified mask image | Alfred Wong | 2005-11-01 |
| 6954911 | Method and system for simulating resist and etch edges | — | 2005-10-11 |
| 6918104 | Dissection of printed edges from a fabrication layout for correcting proximity effects | Youping Zhang | 2005-07-12 |
| 6917411 | Method for optimizing printing of an alternating phase shift mask having a phase shift error | Nanseng Jeng | 2005-07-12 |
| 6880135 | Method of incorporating lens aberration information into various process flows | Fang-Cheng Chang, J. Weed | 2005-04-12 |
| 6866971 | Full phase shifting mask in damascene process | — | 2005-03-15 |
| 6861204 | Design and layout of phase shifting photolithographic masks | Michel Cote | 2005-03-01 |
| 6852471 | Exposure control for phase shifting photolithographic masks | Michel Cote | 2005-02-08 |
| 6846617 | Facilitating optical proximity effect correction through pupil filtering | — | 2005-01-25 |
| 6821689 | Using second exposure to assist a PSM exposure in printing a tight space adjacent to large feature | — | 2004-11-23 |
| 6822848 | Dynamic random access memory (DRAM) circuitry | Martin C. Roberts | 2004-11-23 |
| 6811935 | Phase shift mask layout process for patterns including intersecting line segments | — | 2004-11-02 |
| 6808850 | Performing optical proximity correction on trim-level segments not abutting features to be printed | — | 2004-10-26 |
| 6807663 | Accelerated layout processing using OPC pre-processing | Michel Cote, Philippe Hurat | 2004-10-19 |
| 6797441 | Method and apparatus for using a complementary mask to clear phase conflicts on a phase shifting mask | — | 2004-09-28 |
| 6795168 | Method and apparatus for exposing a wafer using multiple masks during an integrated circuit manufacturing process | Yao-Ting Wang, Fang-Cheng Chang | 2004-09-21 |
| 6792592 | Considering mask writer properties during the optical proximity correction process | Danny Keogan | 2004-09-14 |
| 6792590 | Dissection of edges with projection points in a fabrication layout for correcting proximity effects | Youping Zhang | 2004-09-14 |
| 6787271 | Design and layout of phase shifting photolithographic masks | Michel Cote | 2004-09-07 |
| 6785879 | Model-based data conversion | — | 2004-08-31 |
| 6777141 | Phase shift mask including sub-resolution assist features for isolated spaces | — | 2004-08-17 |
| 6777138 | Mask product made by selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabricat layout | Youping Zhang | 2004-08-17 |
| 6753115 | Facilitating minimum spacing and/or width control optical proximity correction | Youping Zhang | 2004-06-22 |
| 6745372 | Method and apparatus for facilitating process-compliant layout optimization | Michel Cote, Philippe Hurat | 2004-06-01 |
| 6733929 | Phase shift masking for complex patterns with proximity adjustments | — | 2004-05-11 |