Issued Patents All Time
Showing 101–125 of 180 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6524752 | Phase shift masking for intersecting lines | — | 2003-02-25 |
| 6523165 | Alternating phase shift mask design conflict resolution | Hua-Yu Liu, Kent Richardson | 2003-02-18 |
| 6519501 | Method of determining optimum exposure threshold for a given photolithographic model | James Burdorf | 2003-02-11 |
| 6514422 | Simplified etching technique for producing multiple undercut profiles | Karen Huang | 2003-02-04 |
| 6503666 | Phase shift masking for complex patterns | — | 2003-01-07 |
| 6472280 | Method for forming a spacer for semiconductor manufacture | Nanseng Jeng | 2002-10-29 |
| 6463403 | System and method for process matching | James Burdorf | 2002-10-08 |
| 6453457 | Selection of evaluation point locations based on proximity effects model amplitudes for correcting proximity effects in a fabrication layout | Youping Zhang | 2002-09-17 |
| 6440862 | Stepped photoresist profile and opening formed using the profile | Shubneesh Batra | 2002-08-27 |
| 6432619 | Method for reducing photolithographic steps in a semiconductor interconnect process | Nanseng Jeng | 2002-08-13 |
| 6424882 | Method for patterning and fabricating wordlines | — | 2002-07-23 |
| 6421111 | Multiple image reticle for forming layers | — | 2002-07-16 |
| 6418008 | Enhanced capacitor shape | Mark E. Jost, William A. Stanton | 2002-07-09 |
| 6391709 | Enhanced capacitor shape | Mark E. Jost, William A. Stanton | 2002-05-21 |
| 6379847 | Electrically programmable photolithography mask | Douglas J. Cutter | 2002-04-30 |
| 6373976 | Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systems | Baorui Yang | 2002-04-16 |
| 6374396 | Correction of field effects in photolithography | Bill Baggenstoss | 2002-04-16 |
| 6369432 | Enhanced capacitor shape | Mark E. Jost, William A. Stanton | 2002-04-09 |
| 6337172 | Method for reducing photolithographic steps in a semiconductor interconnect process | Nanseng Jeng | 2002-01-08 |
| 6319644 | Methods of reducing proximity effects in lithographic processes | James Burdorf, William Baggenstoss, William A. Stanton | 2001-11-20 |
| 6297879 | Inspection method and apparatus for detecting defects on photomasks | Baorui Yang | 2001-10-02 |
| 6284419 | Methods of reducing proximity effects in lithographic processes | James Burdorf, William Baggenstoss, William A. Stanton | 2001-09-04 |
| 6272236 | Inspection technique of photomask | James Burdorf | 2001-08-07 |
| 6268091 | Subresolution grating for attenuated phase shifting mask fabrication | — | 2001-07-31 |
| 6255024 | Use of attenuating phase-shifting mask for improved printability of clear-field patterns | — | 2001-07-03 |