Issued Patents All Time
Showing 126–150 of 180 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6238824 | Method for designing and making photolithographic reticle, reticle, and photolithographic process | John R. C. Futrell, William A. Stanton | 2001-05-29 |
| 6235638 | Simplified etching technique for producing multiple undercut profiles | Karen Huang | 2001-05-22 |
| 6232191 | Method for forming a spacer for semiconductor manufacture | Nanseng Jeng | 2001-05-15 |
| 6225174 | Method for forming a spacer using photosensitive material | Nanseng Jeng | 2001-05-01 |
| 6221564 | Method for forming a spacer out of photosensitive material | Nanseng Jeng | 2001-04-24 |
| 6218089 | Photolithographic method | — | 2001-04-17 |
| 6200906 | Stepped photoresist profile and opening formed using the profile | Shubneesh Batra | 2001-03-13 |
| 6185473 | Optical pattern transfer tool | — | 2001-02-06 |
| 6178360 | Methods and apparatus for determining optimum exposure threshold for a given photolithographic model | James Burdorf | 2001-01-23 |
| 6162568 | Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light | J. Brett Rolfson | 2000-12-19 |
| 6136480 | Method for fabrication of and apparatus for use as a semiconductor photomask | — | 2000-10-24 |
| 6127096 | Method for reducing photolithographic steps in a semiconductor interconnect process | Nanseng Jeng | 2000-10-03 |
| 6120952 | Methods of reducing proximity effects in lithographic processes | James Burdorf, William Baggenstoss, William A. Stanton | 2000-09-19 |
| 6106980 | Method and apparatus to accurately correlate defect coordinates between photomask inspection and repair systems | Baorui Yang | 2000-08-22 |
| 6106979 | Use of attenuating phase-shifting mask for improved printability of clear-field patterns | — | 2000-08-22 |
| 6096457 | Method for optimizing printing of a phase shift mask having a phase shift error | — | 2000-08-01 |
| 6091845 | Inspection technique of photomask | James Burdorf | 2000-07-18 |
| 6077630 | Subresolution grating for attenuated phase shifting mask fabrication | — | 2000-06-20 |
| 6068951 | Phase shifting mask and process for forming | J. Brett Rolfson | 2000-05-30 |
| 6042973 | Subresolution grating for attenuated phase shifting mask fabrication | — | 2000-03-28 |
| 6040892 | Multiple image reticle for forming layers | — | 2000-03-21 |
| 6037087 | Method to accurately correlate defect coordinates between photomask inspection and repair systems | Baorui Yang | 2000-03-14 |
| 6033814 | Method for multiple process parameter matching | James Burdorf | 2000-03-07 |
| 6023328 | Photomask inspection method and apparatus | — | 2000-02-08 |
| 5998069 | Electrically programmable photolithography mask | Douglas J. Cutter | 1999-12-07 |