Issued Patents All Time
Showing 76–100 of 180 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 6721938 | Optical proximity correction for phase shifting photolithographic masks | Michel Cote | 2004-04-13 |
| 6721928 | Verification utilizing instance-based hierarchy management | Chin-Hsen Lin, Fang-Cheng Chang, Yao-Ting Wang | 2004-04-13 |
| 6717201 | Capacitor structure | Martin C. Roberts | 2004-04-06 |
| 6681379 | Phase shifting design and layout for static random access memory | Michel Cote | 2004-01-20 |
| 6673670 | Method of forming a capacitor structure and DRAM circuitry having a capacitor structure including interior areas spaced apart from one another in a non-overlapping relationship | Martin C. Roberts | 2004-01-06 |
| 6665856 | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects | Youping Zhang | 2003-12-16 |
| 6653026 | Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask | Youping Zhang | 2003-11-25 |
| 6646722 | Multiple image reticle for forming layers | — | 2003-11-11 |
| 6635393 | Blank for alternating PSM photomask with charge dissipation layer | — | 2003-10-21 |
| 6625801 | Dissection of printed edges from a fabrication layout for correcting proximity effects | Youping Zhang | 2003-09-23 |
| 6622288 | Conflict sensitive compaction for resolving phase-shift conflicts in layouts for phase-shifted features | Yao-Ting Wang, Kent Richardson, Shao-Po Wu, Michael Sanie | 2003-09-16 |
| 6610449 | Phase shift masking for “double-T” intersecting lines | — | 2003-08-26 |
| 6584609 | Method and apparatus for mixed-mode optical proximity correction | You-Ping Zhang, Fang-Cheng Chang, Hoyong Park, Yao-Ting Wang | 2003-06-24 |
| 6577010 | Stepped photoresist profile and opening formed using the profile | Shubneesh Batra | 2003-06-10 |
| 6563568 | Multiple image reticle for forming layers | — | 2003-05-13 |
| 6558854 | Process for forming features on a semiconductor wafer using a phase shifting mask that can be used with two different wavelengths of light | J. Brett Rolfson | 2003-05-06 |
| 6560766 | Method and apparatus for analyzing a layout using an instance-based representation | Chin-Hsen Lin, Yao-Ting Wang, Fang-Cheng Chang | 2003-05-06 |
| 6558856 | Subresolution grating for attenuated phase shifting mask fabrication | — | 2003-05-06 |
| 6556277 | Photolithographic apparatus | — | 2003-04-29 |
| 6557162 | Method for high yield reticle formation | — | 2003-04-29 |
| 6551750 | Self-aligned fabrication technique for tri-tone attenuated phase-shifting masks | — | 2003-04-22 |
| 6541165 | Phase shift mask sub-resolution assist features | — | 2003-04-01 |
| 6539521 | Dissection of corners in a fabrication layout for correcting proximity effects | Youping Zhang | 2003-03-25 |
| 6537710 | Electrically programmable photolithography mask | Douglas J. Cutter | 2003-03-25 |
| 6528217 | Electrically programmable photolithography mask | Douglas J. Cutter | 2003-03-04 |