Issued Patents All Time
Showing 26–50 of 180 patents
| Patent # | Title | Co-Inventors | Date |
|---|---|---|---|
| 7422841 | Exposure control for phase shifting photolithographic masks | Michel Cote | 2008-09-09 |
| 7348108 | Design and layout of phase shifting photolithographic masks | Michel Cote | 2008-03-25 |
| 7312003 | Design and layout of phase shifting photolithographic masks | Michel Cote | 2007-12-25 |
| 7236916 | Structure and method of correcting proximity effects in a tri-tone attenuated phase-shifting mask | Youping Zhang | 2007-06-26 |
| 7178128 | Alternating phase shift mask design conflict resolution | Hua-Yu Liu, Kent Richardson | 2007-02-13 |
| 7169515 | Phase conflict resolution for photolithographic masks | Michel Cote | 2007-01-30 |
| 7165234 | Model-based data conversion | — | 2007-01-16 |
| 7155689 | Design-manufacturing interface via a unified model | Alfred Wong | 2006-12-26 |
| 7132203 | Phase shift masking for complex patterns with proximity adjustments | — | 2006-11-07 |
| 7131101 | Displacing edge segments on a fabrication layout based on proximity effects model amplitudes for correcting proximity effects | Youping Zhang | 2006-10-31 |
| 7122281 | Critical dimension control using full phase and trim masks | — | 2006-10-17 |
| 7083879 | Phase conflict resolution for photolithographic masks | Michel Cote | 2006-08-01 |
| 7071058 | Methods of forming capacitors, and methods of forming DRAM circuitry | Martin C. Roberts | 2006-07-04 |
| 7055127 | Mask data preparation | Alfred Wong | 2006-05-30 |
| 7052617 | Simplified etching technique for producing multiple undercut profiles | Karen Huang | 2006-05-30 |
| 7028285 | Standard cell design incorporating phase information | Michel Cote | 2006-04-11 |
| 7014955 | System and method for indentifying dummy features on a mask layer | Fang-Cheng Chang | 2006-03-21 |
| 7010764 | Effective proximity effect correction methodology | — | 2006-03-07 |
| 7005215 | Mask repair using multiple exposures | — | 2006-02-28 |
| 7003757 | Dissection of edges with projection points in a fabrication layout for correcting proximity effects | Youping Zhang | 2006-02-21 |
| 6988259 | Method and apparatus for mixed-mode optical proximity correction | You-Ping Zhang, Fang-Cheng Chang, Hoyong Park, Yao-Ting Wang | 2006-01-17 |
| 6985847 | System and method for process matching | James Burdorf | 2006-01-10 |
| 6981240 | Cutting patterns for full phase shifting masks | Michel Cote | 2005-12-27 |
| 6978436 | Design data format and hierarchy management for phase processing | Michel Cote | 2005-12-20 |
| 6968527 | High yield reticle with proximity effect halos | — | 2005-11-22 |